Patent
Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system
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TLDR
An ion beam sputtering system having a chamber and a target, a substrate, and a movable flux regulator located between the target and the substrate in the chamber is discussed in this article.Abstract:
An ion beam sputtering system having a chamber and a target, a substrate, and a movable flux regulator located between the target and the substrate in the chamber. The position of the movable flux regulator relative to the deposition substrate affects the thickness uniformity of thin films deposited on the substrate in the ion beam sputtering system.read more
Citations
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Patent
Mask for increased uniformity in ion beam deposition
TL;DR: In this paper, a shaper mask for particle flux includes a central part extending from a body of the shaper along a first axis to block at least a first portion of a particle flux through the mask from a first direction.
Patent
Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom
TL;DR: In this article, a method of producing a multilayer structure that has reduced interfacial roughness and interlayer mixing by using a physical-vapor deposition apparatus was proposed.
Patent
Sputter coating apparatus including ion beam source(s), and corresponding method
Scott V. Thomsen,Hugh A. Walton +1 more
TL;DR: In this article, a dual mode chamber is provided that is adapted to receive a removable ion beam module on one side of a substrate and a removable sputtering module on the other side of the substrate.
Patent
Dielectric-layer-coated substrate and installation for production thereof
Baubet Carole,Klaus Fischer,Loergen Marcus,Jean-Christophe Giron,Nicolas Nadaud,Eric Mattman,Jean Paul Rousseau,Alfred Hofrichter,Manfred Jansen +8 more
TL;DR: In this paper, the authors describe a substrate, such as a glass substrate, which is coated with at least one thin dielectric layer, which can be adjusted on the basis of the parameters of the ion source, said ion source being a linear source.
Patent
UV absorbing/reflecting silver oxide layer, and method of making same
TL;DR: In this article, an ion beam including oxygen ions is utilized to densify silver material and transform it into a silver oxide inclusive layer, due to the densification caused by the bombardment of oxygen ions, the resulting silver oxide layer is capable of absorbing and or reflecting significant amounts of UV radiation.
References
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Patent
Magnetoresistive sensor based on the spin valve effect
Bernard Dieny,Bruce A. Gurney,S.E. Lambert,Daniele Mauri,Stuart S. P. Parkin,Virgil Simon Speriosu,Dennis R. Wilhoit +6 more
TL;DR: In this article, the spin valve effect was defined for a magnetoresistive sensor with a first and a second thin film layer of a magnetic material separated by a thin film of a non-magnetic metallic material.
Patent
Dual ion beam ballistic alloying process
TL;DR: In this article, a dual ion beam ballistic alloying process for forming a diamond onto a substrate is described, which comprises the steps of cleaning the surface of the substrate with a first energy beam of inert atoms, depositing a desired non-hydrocarbon substance on the substrate by a low energy, sputtered atomic beam, and simultaneously exposing the substrate to a first, high energy beam with a high energy to grow a ballistically alloyed layer having a thickness of about 10-2000 Å.
Patent
Collimated deposition apparatus and method
TL;DR: In this article, a workpiece is supported in a chamber, particles are emitted from a sputter source in a substantially uniform manner throughout an area of greater lateral extent than the workpiece, the pressure within the chamber is maintained at a level which is sufficiently low to prevent substantial scattering of the particles between the source and the work piece, and the particles are passed through a collimating filter having a plurality of transmissive cells with a length to diameter ratio on the order of 1:1 to 3:1 positioned between the sink and the sink to limit the angles at which the particles can
Patent
Multiple ion source method and apparatus for fabricating multilayer optical films
TL;DR: In this paper, a method of fabricating multiple layer, solid, thin films on a substrate having a surface to be coated, the method providing control over the thickness, stoichiometry, and morphology of each separate layer formed by a method comprising steps: A. forming an ion beam from an inert gas; B, bombarding a target surface with said first ion beam in a vacuum chamber to generate a vapor cloud composed of the target material atoms by the process of sputtering.
Patent
Method of making polycrystalline thin film and superconducting oxide body
Yasuhiro Iijima,Nobuo Tanabe +1 more
TL;DR: In this article, a polycrystalline thin film deposit acting as a substrate material composed of grains of a cubic structure is presented, in which the intergranular misorientation, defined as the orientation difference between the a-axes (or baxes of the neighboring grains, is less than 30 degrees.