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Patent

Non-volatile semiconductor memory

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TLDR
In this article, a tunneling mechanism is used to lower the drain voltage at the time of programming of data, so that degradation of a gate oxide film at a channel portion can be mitigated.
Abstract
Each memory cell of a non-volatile semiconductor memory essentially consisting of a one-transistor type memory cell comprising only of an MOSFET having a floating gate electrode. When an electric programming operation is carried out, a positive voltage is applied to an n type drain region, a negative voltage is applied to a control gate and a source region is grounded. When an erasing operation is carried out, the positive voltage is applied to the control gate while all the other electrodes and a semiconductor substrate are grounded. Low power consumption can be accomplished because both of the programming operation and erasing operations are carried out by utilizing a tunneling mechanism. Particularly because the negative voltage is used for the word line, a drain voltage at the time of programming of data can be lowered, so that degradation of a gate oxide film at a channel portion can be mitigated.

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Citations
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References
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Computer memory cards using flash EEPROM integrated circuit chips and memory-controller systems

TL;DR: In this article, the authors describe an electronic system for a memory system and its controller within a single memory card, where the cards utilize a main circuit board with a plurality of sub-boards attached on both sides, each sub-board carrying several integrated circuit chips.
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TL;DR: In this article, a column latch and a high voltage switch connected to each bit line are eliminated, and an address counter and the data latch are newly provided, arranged between an I/O buffer and a Y gate.
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TL;DR: In this article, a single-transistor nonvolatile memory cell MOS transistor with a floating gate and a control gate using two levels of polysilicon and a tunnel dielectric that overlaps the drain area was presented.
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