The Performances and Challenges of Today’s EB Lithography and EB-resist Materials
TLDR
In this paper, the performance of conventional mask fabricating process was examined and the impact of proximity effect to the resist performance was examined, showing that resist damage induced by proximity effect degrades the resolution limit about 2nm.Abstract:
To investigate the possibility to catch up the NGL mask pattern size scaling strategy which indicated in ITRS2012, the performance of conventional mask fabricating process was examined. Current EB resist used for mask fabrication doesn’t have enough performance to resolve below hp20nm pattern. With newly developed CAR resist, the resolution limit reached to hp18nm pattern. Furthermore by using higher performance EB writer, the possibility to resolve up to hp16nm pattern was showed. The impact of proximity effect to the resist performance was examined. The resist damage induced by proximity effect degrades the resolution limit about 2nm. This is a serious problem for NGL mask manufacturing. Reducing the impact of proximity effect is one of the major challenges for developing higher resolution EB resist.read more
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Journal ArticleDOI
Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography
TL;DR: An electron beam (EB) lithography method using inedible cellulose-based resist material derived from woody biomass has been successfully developed and allows the use of pure water in the development process instead of the conventionally used tetramethylammonium hydroxide and anisole.
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Nanoelectrode lithography using flexible conductive molds
TL;DR: In this article, a pattern transfer technique based on an anodic oxidation reaction (AOR) using two kinds of flexible conductive molds (FCMs) was reported, which enables fine pattern transfer on an uneven surface with 1.8-µm-deep recesses and also improves the transfer uniformity on a flat surface.
Proceedings ArticleDOI
EB and EUV lithography using inedible cellulose-based biomass resist material
Satoshi Takei,Satoshi Takei,Makoto Hanabata,Akihiro Oshima,Miki Kashiwakura,Takahiro Kozawa,Seiichi Tagawa +6 more
TL;DR: In this article, the water developable, non-chemically amplified, high sensitive, and negative tone resist material in EB and EUV lithography was developed for environmental affair, safety, easiness of handling, and health of the working people.
Proceedings ArticleDOI
Thin-film edge electrode lithography enabling low-cost collective transfer of nanopatterns
TL;DR: In this paper, a new lithography method using thin-film edge electrodes (TEEs) to collectively transfer nanopatterns by generating oxide on the substrate surface via an electrochemical reaction (ECR) was reported.