How to remove contamination after pmma transformation?
Contamination after PMMA transformation can be removed using various methods. One approach is to form a PMMA-urea complex and then remove urea and the contaminant together with methanol, which can purify commercial PMMA and reveal its true glass transition temperature . Another method involves modifying the polarity of PMMA under deep-UV irradiation and then dissolving the exposed PMMA in an alcohol/water mixture, resulting in the complete removal of the polymer residues without degrading the properties of graphene . Laser exposure can also be used to remove PMMA residues on graphene films, leading to higher carrier mobility and lower contact resistance in graphene field-effect transistors . Additionally, optimizing the PMMA solution used for transferring graphene can minimize the amount of PMMA residues, ensuring reproducible device performance . Various techniques such as thermal annealing, plasma treatment, ion beam treatment, and mechanical treatments can be employed to reduce PMMA residues, each with its own advantages and mechanisms .
Answers from top 4 papers
| Papers (4) | Insight |
|---|---|
42 Citations | The paper discusses various methods to remove PMMA residues on graphene, including thermal annealing, plasma and ion beam treatment, light treatment, and mechanical treatments. |
| The paper proposes a laser cleaning technique to remove PMMA residues on graphene surfaces without introducing defects. | |
17 Citations | The paper suggests that the contamination in PMMA can be removed by forming a PMMA-urea complex and then removing urea and the contaminant together with methanol. |
| The paper describes a green and scalable technique for removing PMMA contamination from graphene using deep-UV irradiation and a high-polarity mixture of isopropyl alcohol/water. |