Showing papers on "Mask inspection published in 1977"
08 Aug 1977
TL;DR: In this article, the authors discuss some methods available for the detection of random defects and describe a newly developed automatic mask inspection system, which can be used to detect photomasks defects.
Abstract: Semiconductor yield can be greatly affected by defective photomasks. Various methods of detection of photomask defects have been investigated in the past. This paper discusses some methods available for the detection of random defects and describes a newly developed automatic mask inspection system.
8 citations
08 Aug 1977
TL;DR: The Automatic Mask Inspection System (AMIS) has been in routine operation for measuring the defect count on various types of masks at Bell Laboratories, Murray Hill, N.J., since February, 1975.
Abstract: This paper was prepared for presentation at the SPIE meeting, "Developments in Semiconductor Microlithography II", held in San Jose, California, April 4-5, 1977. Most photolithographic masks have defects, and one of the most difficult tasks of the mask maker is to locate and identify these defects. A knowledge of the size, type, and location of defects is needed not only to tell the wafer process area how good, or bad, the delivered masks are but also to help the mask shop make better masks. An Automatic Mask Inspection System (AMIS) has been in routine operation for measuring the defect count on various types of masks at Bell Laboratories, Murray Hill, N.J., since February, 1975. This talk will give a brief description of AMIS and will describe its use in photomask manufacture.
6 citations
Patent•
06 Apr 1977
TL;DR: In this article, the cross-reference inspection of the original pictures and the data is performed by turning pattern information of original pictures to digital information and operate the same together with the information signals of data.
Abstract: PURPOSE:To turn pattern information of original pictures to digital information and operate the same together with the information signals of data thereby making possible the cross-reference inspection of the original pictures and the data
4 citations
Patent•
05 Jul 1977
TL;DR: In this article, the authors proposed a method to automatically detect the presence or absence of defects in a mask and indicate the defect position on the actual mask if there is any defect.
Abstract: PURPOSE:To accurately identify the position of defects and make possible rapid correction operation for said defects by automatically detecting the presence or absence of defects in a mask and indicating the defect position on the actual mask if there is any defect.
1 citations