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A. Corvisier

Researcher at University of Poitiers

Publications -  7
Citations -  75

A. Corvisier is an academic researcher from University of Poitiers. The author has contributed to research in topics: Thin film & Anti-reflective coating. The author has an hindex of 2, co-authored 6 publications receiving 33 citations.

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Thermal hysteresis measurement of the VO 2 dielectric function for its metal-insulator transition by visible-IR ellipsometry

TL;DR: In this article, the real and imaginary parts of the dielectric function of VO2 thin films, deposited on rplane sapphire via pulsed laser deposition, are measured by means of visible-infrared ellipsometry for wavelengths ranging from 0.4 to 15μm and temperatures within its phase transition.
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Nanostructure and Physical Properties Control of Indium Tin Oxide Films Prepared at Room Temperature through Ion Beam Sputtering Deposition at Oblique Angles

TL;DR: In this article, the fabrication of porous and crystalline tin-doped indium oxide (ITO) thin films at room temperature by ion beam sputtering deposition at oblique angles using either argon or xenon ions is reported.
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Surface oxidation of amorphous Si and Ge slanted columnar and mesoporous thin films: Evidence, scrutiny and limitations for infrared optics

TL;DR: In this article, the authors showed that mesoporous amorphous silicon and germanium photonic layers generated at oblique angles can oxidize at 3.6-4.9μm by removing the light reflection.
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Optical and nanostructural insights of oblique angle deposited layers applied for photonic coatings

TL;DR: In this article, the porosity gradient profile and aspect ratio of the nanocolumns were extracted by generalized ellipsometry to evaluate the influence of the microstructural properties on the optical response of the films.
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Anisotropic optical properties of indium tin oxide thin films prepared by ion beam sputtering under oblique angle deposition

TL;DR: In this article , porous slanted columnar thin films of indium tin oxide are prepared under oblique angle deposition (OAD) by Ion Beam Sputtering (IBS) using argon and xenon as process ions.