Silicon has long been established as the material of choice for the microelectronics industry. This is not yet true in photonics, where the limited degrees of freedom in material design combined with the indirect bandgap are a major constraint. Recent developments, especially those enabled by nanoscale engineering of the electronic and photonic properties, are starting to change the picture, and some silicon nanostructures now approach or even exceed the performance of equivalent direct-bandgap materials. Focusing on two application areas, namely communications and photovoltaics, we review recent progress in silicon nanocrystals, nanowires and photonic crystals as key examples of functional nanostructures. We assess the state of the art in each field and highlight the challenges that need to be overcome to make silicon a truly high-performing photonic material.

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Silicon nanostructures for photonics and photovoltaics

Hybrid silicon lasers based on bonded III–V layers on silicon are currently the best contenders for on-chip lasers for silicon photonics. On-chip silicon light sources are highly desired for use as electrical-to-optical converters in silicon-based photonics. Zhiping Zhou and Bing Yin of Peking University in China and Jurgen Michel of Massachusetts Institute of Technology assess the three main contenders for such light sources: erbium-based light sources, germanium-on-silicon lasers and III-V-based silicon lasers. They consider operating wavelength, pumping conditions, power consumption, thermal stability and fabrication process. The scientists regard the power efficiencies of electrically pumped erbium-based lasers as being too low and the threshold currents of germanium lasers as being too high. They conclude that III–V quantum dot lasers monolithically grown on silicon show the most promise for realizing on-chip lasers.

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On-chip light sources for silicon photonics

Nonthermal plasmas have emerged as a viable synthesis technique for nanocrystal materials. Inherently solvent and ligand-free, nonthermal plasmas offer the ability to synthesize high purity nanocrystals of materials that require high synthesis temperatures. The nonequilibrium environment in nonthermal plasmas has a number of attractive attributes: energetic surface reactions selectively heat the nanoparticles to temperatures that can strongly exceed the gas temperature; charging of nanoparticles through plasma electrons reduces or eliminates nanoparticle agglomeration; and the large difference between the chemical potentials of the gaseous growth species and the species bound to the nanoparticle surfaces facilitates nanocrystal doping. This paper reviews the state of the art in nonthermal plasma synthesis of nanocrystals. It discusses the fundamentals of nanocrystal formation in plasmas, reviews practical implementations of plasma reactors, surveys the materials that have been produced with nonthermal pla...

Nonthermal Plasma Synthesis of Nanocrystals: Fundamental Principles, Materials, and Applications

Silicon quantum dots (SiQDs) hold great promise for many future technologies. Silicon is already at the core of photovoltaics and microelectronics, and SiQDs are capable of efficient light emission and amplification. This is crucial for the development of the next technological frontiers—silicon photonics and optoelectronics. Unlike any other quantum dots (QDs), SiQDs are made of non-toxic and abundant material, offering one of the spectrally broadest emission tunabilities accessible with semiconductor QDs and allowing for tailored radiative rates over many orders of magnitude. This extraordinary flexibility of optical properties is achieved via a combination of the spatial confinement of carriers and the strong influence of surface chemistry. The complex physics of this material, which is still being unraveled, leads to new effects, opening up new opportunities for applications. In this review we summarize the latest progress in this fascinating research field, with special attention given to surface-induced effects, such as the emergence of direct bandgap transitions, and collective effects in densely packed QDs, such as space separated quantum cutting.

https://iopscience.iop.org/article/10.1088/0953-8984/26/17/173201/pdf

Silicon quantum dots: surface matters

After decades of process scaling driven by Moore's law, the silicon microelectronics world is now defined by length scales that are many times smaller than the dimensions of typical micro-optical components. This size mismatch poses an important challenge for those working to integrate photonics with complementary metal oxide semiconductor (CMOS) electronics technology. One promising solution is to fabricate optical systems at metal/dielectric interfaces, where electromagnetic modes called surface plasmon polaritons (SPPs) offer unique opportunities to confine and control light at length scales below 100 nm (refs 1, 2). Research groups working in the rapidly developing field of plasmonics have now demonstrated many passive components that suggest the potential of SPPs for applications in sensing and optical communication. Recently, active plasmonic devices based on III-V materials and organic materials have been reported. An electrical source of SPPs was recently demonstrated using organic semiconductors by Koller and colleagues. Here we show that a silicon-based electrical source for SPPs can be fabricated using established low-temperature microtechnology processes that are compatible with back-end CMOS technology.

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A silicon-based electrical source of surface plasmon polaritons.

We demonstrate experimentally bipolar (electrons and holes) current injection into silicon nanocrystals in thin nanocrystalline-Si/SiO2 multilayers. These light emitting devices have power efficiency of 0.17% and turn-on voltage of 1.7 V. The high electroluminescence efficiency and low onset voltages are attributed to the radiative recombination of excitons formed by both electron and hole injection into silicon nanocrystals via the direct tunneling mechanism. To confirm the bipolar character, different devices were grown, with and without a thick silicon oxide barrier at the multilayer contact electrodes. A transition from bipolar tunneling to unipolar Fowler–Nordheim tunneling is thus observed.

High power efficiency in Si-nc/SiO2 multilayer light emitting devices by bipolar direct tunneling

Thin film metal-oxide-semiconductor light emitting devices (LEDs) based on nanocrystalline silicon multilayer structure were grown by plasma-enhanced chemical vapor deposition. Room temperature electroluminescence was studied under direct current and time-resolved pulsed-current injection schemes. Multilayer LEDs operating at voltages below 5 V and electroluminescence turn-on voltage of 1.4–1.7 V are demonstrated. The turn-on voltage is less than 3.2 V which corresponds to the barrier height at the silicon oxide interface for electrons. Electrical injection in the multilayer LED is controlled by direct tunneling of electrons and holes among silicon nanocrystals. This injection regime is different than the Fowler–Nordheim tunneling that controls the electron injection in single thick layer LED operating at high voltages. A comparison of the power efficiency for the multilayer based LED and a similar single thick layer LED shows larger power efficiency for the former than for the second. Our results open ne...

Low-voltage onset of electroluminescence in nanocrystalline-Si/SiO2 multilayers

Silicon nanocrystals as a photoluminescence down shifter for solar cells

In this paper we report the visible–near-infrared light emission properties of nanocrystalline silicon (nc-Si) light emitting devices (LEDs) based on nc-Si/SiO2 multilayer structures. Multilayer structures of silicon-rich oxide (SRO) and SiO2 were grown by plasma enhanced chemical vapor deposition (PECVD) and studied by transmission electron microscopy (TEM) and ellipsometry. A higher nc-Si density in the multilayer samples than in the homogeneous sample was found by comparing photoluminescence (PL) intensities. The PL band located in the near-infrared region can be tuned by the size of nc-Si, which in the multilayer sample is controlled by the thickness of the SRO layer. The multilayer LED shows a much larger current density under low applied voltages than the LED based on a single thick layer. The significant lower driving voltage and enhanced light emission intensity suggest higher power efficiency in multilayer LED. It is believed that the improvement of the LED characteristics is due to the higher nc-Si density caused by the multilayer structure.

Light emitting devices based on nanocrystalline-silicon multilayer structure

We propose a simple way to engineer the energy band gap of an ensemble of silicon nanocrystal (Si-NC) embedded in SiO2 via thickness/composition profiling of Si-NC multilayers. By means of a complementary metal-oxide-semiconductor compatible process, light emitting diodes (LEDs) which incorporate graded energy gap Si-NC multilayers in the active region have been grown. Electrical and optical properties of these graded Si-NC LEDs demonstrate the ability of the proposed method to tailor the optoelectronic properties of Si-NC devices.

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A. Marconi

Papers

High power efficiency in Si-nc/SiO2 multilayer light emitting devices by bipolar direct tunneling

Low-voltage onset of electroluminescence in nanocrystalline-Si/SiO2 multilayers

Silicon nanocrystals as a photoluminescence down shifter for solar cells

Light emitting devices based on nanocrystalline-silicon multilayer structure

Graded-size Si quantum dot ensembles for efficient light-emitting diodes