A
Adrian P. Sutton
Researcher at Imperial College London
Publications - 228
Citations - 20797
Adrian P. Sutton is an academic researcher from Imperial College London. The author has contributed to research in topics: Grain boundary & Dislocation. The author has an hindex of 47, co-authored 228 publications receiving 18153 citations. Previous affiliations of Adrian P. Sutton include University of Helsinki & University of Pennsylvania.
Papers
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Journal ArticleDOI
The equilibrium structures of the 90° partial dislocation in silicon
TL;DR: In this paper, the free energies of the single-period and double-period core reconstructions of the straight 90° partial dislocation in silicon were analyzed with a harmonic model.
Journal ArticleDOI
Influence of Adsorbate Monolayer on the Nano-Mechanics of TIP-Substrate Interactions
TL;DR: In this paper, constant temperature molecular dynamics simulations were employed to study the interaction of an Ir tip with a Pb substrate, showing that the introduction of the adsorbate considerably reduced the work of adhesion and the extent of plastic flow.
Journal ArticleDOI
Stacking faults and the -surface on first-order pyramidal planes in -titanium
TL;DR: In this paper, the authors calculated the surface of the first-order pyramidal planes in -titanium polycrystals and found one low energy and one high energy stacking fault with energies of 163 and 681, respectively.
BookDOI
Physics of Elasticity and Crystal Defects
TL;DR: In this article, the authors introduce linear elasticity and its application to point defects, dislocations and cracks, and give exercises to help the student check their understanding as they work through each chapter.
Journal ArticleDOI
Equilibrium Distributions and the Nanostructure Diagram for Epitaxial Quantum Dots
Robert E. Rudd,G. A. D. Briggs,Adrian P. Sutton,Gilberto Medeiros-Ribeiro,R. Stanley Williams +4 more
TL;DR: In this article, a thermodynamic equilibrium model for the growth of nanostructures on semiconductor substrates in heteroepitaxy and its application to germanium deposition on silicon is presented.