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Arrelaine A. Dameron

Researcher at National Renewable Energy Laboratory

Publications -  76
Citations -  2692

Arrelaine A. Dameron is an academic researcher from National Renewable Energy Laboratory. The author has contributed to research in topics: Atomic layer deposition & Catalysis. The author has an hindex of 24, co-authored 75 publications receiving 2434 citations. Previous affiliations of Arrelaine A. Dameron include Pennsylvania State University.

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Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition

TL;DR: In this paper, multilayers of Al2O3 ALD and SiO2 ALD were grown on Kapton and heat-stabilized polyethylene naphthalate substrates.
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Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers.

TL;DR: Effective surface chemistry strategies are being developed for MLD that offer the opportunity for future advances in materials and device fabrication and expect that the advances in MLD will lead to innovations in polymeric thin-film products.
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Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition

TL;DR: In this article, an Al2O3 film with a thickness of only 5 nm on a SiN PECVD film with thickness of 100 nm was shown to achieve a water vapor transmission rate of 5×10−5g/m2
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Molecular Engineering and Measurements To Test Hypothesized Mechanisms in Single Molecule Conductance Switching

TL;DR: In this article, six customized phenylene-ethynylene-based oligomers have been studied for their electronic properties using scanning tunneling microscopy to test hypothesized mechanisms of stochastic conductance switching.
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Structures and displacement of 1-adamantanethiol self-assembled monolayers on Au{111}.

TL;DR: It is shown that these 1-adamantanethiolate monolayers are labile with respect to displacement by exposing them to dilute solutions of alkanethiols, and Facile displacement of low interaction strength SAMs can be exploited to enhance patterning using soft nanolithography.