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Björn Kaemena
Researcher at University of Bremen
Publications - 9
Citations - 180
Björn Kaemena is an academic researcher from University of Bremen. The author has contributed to research in topics: Cerium oxide & Silicon. The author has an hindex of 7, co-authored 9 publications receiving 160 citations.
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Journal ArticleDOI
Growth and Morphology of Ceria on Ruthenium (0001)
TL;DR: In this article, a growth and morphology study of the inverse catalyst model system ceria on Ru(0001) was performed by applying spectroscopic photoemission and low-energy electron microscopy.
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Silicate-free growth of high-quality ultrathin cerium oxide films on Si(111)
Jan Ingo Flege,Björn Kaemena,S. Gevers,Florian Bertram,Torsten Wilkens,Daniel Bruns,Jan Bätjer,Thomas Schmidt,Joachim Wollschläger,Jens Falta +9 more
TL;DR: In this paper, it is demonstrated that highly ordered, mostly $B$-oriented, epitaxial ceria films can be achieved by preadsorption of a monolayer of atomic chlorine, effectively passivating the substrate and thereby suppressing cerium silicate and silicon oxide formation at the interface.
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Growth mode and oxidation state analysis of individual cerium oxide islands on Ru(0001)
TL;DR: Although even at this high growth temperature the micron-sized CeO₂(111) islands are found to exhibit different lattice registries with respect to the hexagonal substrate, the combination of dark-field LEEM and local intensity-voltage analysis reveals that the oxidation state of the islands is homogeneous down to the 10 nm scale.
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Origin of chemical contrast in low-energy electron reflectivity of correlated multivalent oxides: The case of ceria
Jan Ingo Flege,Björn Kaemena,Axel Meyer,Jens Falta,Sanjaya D. Senanayake,Jerzy T. Sadowski,R. D. Eithiraj,Eugene E. Krasovskii +7 more
TL;DR: In this article, a combined experimental and theoretical study of the local chemistry of cerium oxide films and islands on Ru(0001) is presented based on intensityvoltage low-energy electron microscopy [$I(V)$-LEEM] and resonant x-ray photoemission spectroscopy.
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Ultrathin, epitaxial cerium dioxide on silicon
Jan Ingo Flege,Björn Kaemena,Jan Höcker,Florian Bertram,Joachim Wollschläger,Thomas J. Schmidt,Jens Falta +6 more
TL;DR: In this article, it was shown that ultrathin, highly ordered, continuous films of cerium dioxide may be prepared on silicon following substrate prepassivation using an atomic layer of chlorine.