B
Brennan Milligan
Researcher at ASM International
Publications - 5
Citations - 168
Brennan Milligan is an academic researcher from ASM International. The author has contributed to research in topics: Thin film & Silane. The author has an hindex of 3, co-authored 5 publications receiving 166 citations.
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Patent
Silane and borane treatments for titanium carbide films
Jerry Chen,Vladimir Machkaoutsan,Brennan Milligan,Jan Willem Maes,Suvi Haukka,Eric Shero,Tom E. Blomberg,Dong Li +7 more
TL;DR: In this article, methods of treating metal-containing thin films, such as films comprising titanium carbide, with a silane or borane agent are provided, where the process may include a plurality of deposition cycles involving alternating and sequential pulses of a first source chemical that comprises titanium and at least one halide ligand, a second source chemical comprising metal and carbon, wherein the metal and the carbon from the second source chemicals are incorporated into the thin film, and a third source chemical is a Silane or Borane that at least partially reduces oxidized portions of the titanium
Patent
Plasma-enhanced pulsed deposition of metal carbide films
TL;DR: In this paper, a transition metal species is reacted with a carbon species to deposit a metal carbide film, where the carbon species and the transition metal are part of the same precursor compound, e.g., a metal organic compound.
Proceedings ArticleDOI
Development of a robust reverse tone pattern transfer process
Niyaz Khusnatdinov,Gary Doyle,Douglas J. Resnick,Zhengmao Ye,Dwayne L. LaBrake,Brennan Milligan,Fred Alokozai,Jerry Chen +7 more
TL;DR: The purpose of this paper is to describe the use of a three layer reverse tone process (RTP) that is capable of reversing the tone of every printed feature type, utilizes a resist pattern, a hardmask layer and an additional protection layer.
Proceedings ArticleDOI
Nickel suicide for source-drain contacts from ALD NiO films
Viljami Pore,Eva Tois,Raija H. Matero,Suvi Haukka,Marko Tuominen,Jacob Woodruff,Brennan Milligan,Fu Tang,Michael Eugene Givens +8 more
TL;DR: In this article, the preparation of nickel monosilicide (NiSi) layers on silicon using a conformal NiO ALD process and thin sacrificial Ge interlayers is demonstrated.
Patent
Method of treating nitride thin film on substrate
Jerry Chen,Vladimir Machkaoutsan,Brennan Milligan,Jan Willem Maes,Suvi Haukka,Eric Shero,Tom E. Blomberg,Dong Li +7 more
TL;DR: In this article, a method of treating a nitride thin film on a substrate to form a capping layer including silicon or boron is provided, where the nitride film is exposed to a silane compound or a borane compound, such that a CApping layer comprising silicon or Boron is formed.