C
C. Moura
Researcher at University of Minho
Publications - 41
Citations - 640
C. Moura is an academic researcher from University of Minho. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 14, co-authored 39 publications receiving 580 citations.
Papers
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Characterisation of chromium nitride films produced by PVD techniques
TL;DR: In this article, the influence of process parameters such as substrate bias and partial pressure of reactive gas have been investigated by X-ray diffraction (XRD), Raman Spectroscopy (RS) and nano-indentation experiments.
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Property change in ZrNxOy thin films: effect of the oxygen fraction and bias voltage
Filipe Vaz,P. Carvalho,Luís Miguel Cunha,L. Rebouta,C. Moura,Eduardo Alves,A.R. Ramos,Albano Cavaleiro,Ph. Goudeau,J.P. Rivière +9 more
TL;DR: In this article, the main purpose of this work consists on the preparation of single layered zirconium oxynitride, ZrN x O y, thin films, deposited by rf reactive magnetron sputtering.
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Structural evolution in ZrNxOy thin films as a function of temperature
Luís Miguel Cunha,Filipe Vaz,C. Moura,L. Rebouta,P. Carvalho,Eduardo Alves,Albano Cavaleiro,Ph. Goudeau,J.P. Rivière +8 more
TL;DR: In this article, single-layered Zirconium oxynitride (ZrN x O y ) thin films have been deposited on steel substrates, at a constant temperature of 300 °C, by radiofrequency (rf) reactive magnetron sputtering of a pure Zr target in an argon-oxygen-nitrogen atmosphere.
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Raman spectra and structural analysis in ZrOxNy thin films
TL;DR: In this article, the authors used Raman spectroscopy to characterize the structural evolution of magnetron-sputtered decorative zirconium oxynitride ZrOxNy films which result from an increase of reactive gas flow in the deposition.
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Properties of tantalum oxynitride thin films produced by magnetron sputtering: The influence of processing parameters
Daniel Cristea,Daniel Cristea,D. Constantin,D. Constantin,Aurel Crisan,C.S. Abreu,C.S. Abreu,José R. B. Gomes,N.P. Barradas,Eduardo Alves,C. Moura,Filipe Vaz,Luís Miguel Cunha +12 more
TL;DR: In this article, a set of tantalum oxynitride (TaNxOy) thin films were prepared by varying the reactive gases flow rate, using a N2/O2 gas mixture with a concentration ratio of 17:3.