Instabilities in semiconductor heterostructure growth can be exploited for the self-organized formation of nanostructures, allowing for carrier confinement in all three spatial dimensions. Beside the description of various growth modes, the experimental characterization of structural properties, such as size and shape, chemical composition, and strain distribution is presented. The authors discuss the calculation of strain fields, which play an important role in the formation of such nanostructures and also influence their structural and optoelectronic properties. Several specific materials systems are surveyed together with important applications.

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Structural properties of self-organized semiconductor nanostructures

The use of a high-growth-temperature GaAs spacer layer is demonstrated to significantly improve the performance of 1.3μm multilayer self-assembled InAs∕InGaAs dot-in-a-well lasers. The high-growth-temperature spacer layer inhibits threading dislocation formation, resulting in enhanced electrical and optical characteristics. Incorporation of these spacer layers allows the fabrication of multilayer quantum-dot devices emitting above 1.3μm, with extremely low room-temperature threshold current densities and with operation up to 105°C.

Improved performance of 1.3 μm multilayer InAs quantum-dot lasers using a high-growth-temperature GaAs spacer layer

We report the first operation of an electrically pumped 1.3-μm InAs/GaAs quantum-dot laser epitaxially grown on a Si (100) substrate. The laser structure was grown directly on the Si substrate by molecular beam epitaxy. Lasing at 1.302 μm has been demonstrated with threshold current density of 725 A/cm2 and output power of ~26 mW for broad-area lasers with as-cleaved facets at room temperature. These results are directly attributable to the optimized growth temperature of the initial GaAs nucleation layer.

1.3-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates.

The first decade of the 21st-century has seen a rapid development in infrared photodetector technology. At the end of the last millennium there were two dominant IR systems, InSb- and HgCdTe-based detectors, which were well developed and available in commercial systems. While these two systems saw improvements over the last twelve years, their change has not nearly been as marked as that of the quantum-based detectors (i.e., QWIPs, QDIPs, DWELL-IPs, and SLS-based photodetectors). In this paper, we review the progress made in all of these systems over the last decade plus, compare the relative merits of the systems as they stand now, and discuss where some of the leading research groups in these fields are going to take these technologies in the years to come.

Progress in Infrared Photodetectors Since 2000

Nanometre-scale semiconductor devices have been envisioned as next-generation technologies with high integration and functionality. Quantum dots, or the so-called ‘artificial atoms’, exhibit unique properties due to their quantum confinement in all 3D. These unique properties have brought to light the great potential of quantum dots in optoelectronic applications. Numerous efforts worldwide have been devoted to these promising nanomaterials for next-generation optoelectronic devices, such as lasers, photodetectors, amplifiers, and solar cells, with the emphasis on improving performance and functionality. Through the development in optoelectronic devices based on quantum dots over the last two decades, quantum dot devices with exceptional performance surpassing previous devices are evidenced. This review describes recent developments in quantum dot optoelectronic devices over the last few years. The paper will highlight the major progress made in 1.3 μm quantum dot lasers, quantum dot infrared photodetectors, and quantum dot solar cells.

https://iopscience.iop.org/article/10.1088/0022-3727/48/36/363001/pdf

Quantum dot optoelectronic devices: lasers, photodetectors and solar cells

The structural and optical properties of GaAs-based 1.3 μm InAs/InGaAs dots-in-a-well (DWELL) structures have been optimized in terms of different InGaAs and GaAs growth rates, the amount of InAs deposited, and In composition of the InGaAs quantum well (QW). An improvement in the optical efficiency is obtained by increasing the growth rate of the InGaAs and GaAs layers. A transition from small quantum dots (QDs), with a high density (∼5.3×1010 cm−2) and broad size distribution, to larger quantum dots with a low dot density (∼3.6×1010 cm−2) and narrow size distribution, occurs as the InAs coverage is increased from 2.6 to 2.9 monolayers. The room-temperature optical properties also improve with increased InAs coverage. A strong dependence of the QD density and the QD emission wavelength on the In composition of InGaAs well has been observed. By investigating the dependence of the dot density and the high-to-width ratio of InAs islands on the matrix of InGaAs strained buffer layer (SBL), we show that the increasing additional material from wetting layer and InGaAs layer into dots and the decreasing repulsive strain field between neighboring islands within substrate are responsible for improving QD density with increasing In composition in InGaAs SBL. The optical efficiency is sharply degraded when the InGaAs QW In composition is increased from 0.15 to 0.2. These results suggest that the optimum QW composition for 1.3 μm applications is ∼15%. Our optimum structure exhibits a room temperature emission of 1.32 μm with a linewidth of 27 meV.

Optimizing the growth of 1.3 μm InAs/InGaAs dots-in-a-well structure

We describe an optical study of structures consisting of an InAlAs-GaAs strained buffer layer and an InAlAs-InGaAs composite strain-reducing layer designed to modify the confining potential of 1.3-μm InAs/GaAs quantum dots (QDs). With increasing (decreasing) InAlAs (InGaAs) thickness in the strain-reducing layer grown above the QDs, the integrated photoluminescence (PL) intensity of the QD ground-state transition increases dramatically and the emission wavelength decreases slightly from 1.36 to 1.31 μm. The enhancement of PL efficiency is temperature dependent, being much greater above 200 K. A maximum enhancement of 450 is achieved at room temperature. This improvement of the high-temperature PL efficiency should lead to a significant improvement in the characteristics of 1.3-μm InAs/GaAs QD lasers.

Engineering carrier confinement potentials in 1.3-μm InAs/GaAs quantum dots with InAlAs layers: Enhancement of the high-temperature photoluminescence intensity

C. N. Harrison

Papers

Optimizing the growth of 1.3 μm InAs/InGaAs dots-in-a-well structure

Engineering carrier confinement potentials in 1.3-μm InAs/GaAs quantum dots with InAlAs layers: Enhancement of the high-temperature photoluminescence intensity