C
C.Y. Ting
Researcher at IBM
Publications - 3
Citations - 294
C.Y. Ting is an academic researcher from IBM. The author has contributed to research in topics: Diffusion barrier & Silicon. The author has an hindex of 3, co-authored 3 publications receiving 292 citations.
Papers
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Journal ArticleDOI
The use of titanium-based contact barrier layers in silicon technology
C.Y. Ting,M. Wittmer +1 more
TL;DR: The use of a diffusion barrier layer in the contact structure, which prevents metallurgical reactions as well as diffusion between the silicon or silicide and the contact metal, is the most common approach to achieve stable and reliable contacts.
Journal ArticleDOI
Investigation of Tin films reactively sputtered using a sputter gun
Kie Y. Ahn,M. Wittmer,C.Y. Ting +2 more
TL;DR: In this paper, reactive sputtering of titanium in a gas mixture of argon and nitrogen using a sputter gun was investigated with Rutherford backscattering spectrometry, electrical resistivity and optical reflectivity measurements, X-ray diffractometry and transmission electron microscopy.
Journal ArticleDOI
TiN as a high temperature diffusion barrier for arsenic and boron
TL;DR: In this article, the use of TiN thin films as high temperature diffusion barrier layers for arsenic and boron was investigated, and the results indicated that TiN is a good diffusion barrier for arsenic at 900°C and it becomes ineffective at 1000°C.