Corinne Grévent

TL;DR: In this article, the suitability of atomic layer deposition (ALD) for SiO2 optical coatings and applied it to broadband antireflective multilayers in combination with HfO2 as the high refractive index material.

TL;DR: This work demonstrates an alternative method that allows the direct, simple, and fast fabrication of FZPs using focused Ga(+) beam lithography practically, in a single step and is expected to increase the accessibility of high-resolution optics to a wider community of researchers working on soft X-ray and extreme ultraviolet microscopy using synchrotron radiation and advanced laboratory sources.

TL;DR: This work shows a novel method to fabricate FZPs based on multilayer deposition with atomic layer deposition (ALD) and subsequent sectioning with focused ion beam (FIB) and presents high potential for high resolution microscopy in both the soft and hard X-ray range.

TL;DR: It is shown that ion beam lithography (IBL) may advantageously simplify Fresnel Zone Plates preparation and measured efficiencies in the 1st and 2nd order of diffraction reach the theoretical predictions.

TL;DR: In this article, two kinoform lenses made out of polycrystalline gold and nano-crystaline PdSi are successfully fabricated, thoroughly characterized and tested for their ultimate focusing performances at soft X-ray energies.