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Derek Tishler

Researcher at University of Central Florida

Publications -  5
Citations -  398

Derek Tishler is an academic researcher from University of Central Florida. The author has contributed to research in topics: Phonon & Graphene. The author has an hindex of 4, co-authored 5 publications receiving 348 citations.

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Effects of layer stacking on the combination Raman modes in graphene.

TL;DR: In this paper, the authors observed new combination modes in the range from 1650 to 2300 cm−1 in single-SLG, bi-, few-layer and incommensurate bilayer graphene (IBLG) on silicon dioxide substrates.
Journal Article

Effects of Layer Stacking on the Combination Raman Modes in Graphene

TL;DR: New combination modes in the range from 1650 to 2300 cm(-1) in single-(SLG), bi-, few-layer and incommensurate bilayer graphene (IBLG) on silicon dioxide substrates are observed and the peak frequency of the 1880 (2220) cm (-1) mode is observed to increase (decrease) linearly with increasing graphene layers.
Journal ArticleDOI

Multiphonon Raman scattering in graphene

TL;DR: In this paper, the multiphonon Raman scattering in graphene samples was investigated and higher-order combination modes involving three and four phonons were observed in single-layer, bilayer, and few-layer graphene samples prepared by mechanical exfoliation.
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Solid-state NMR characterization of the molecular conformation in disordered methyl α-L-rhamnofuranoside.

TL;DR: A concerted rearrangement of OH hydrogens is proposed to account for the observed dynamic disorder in disordered methyl α-L-rhamnofuranoside and the relatively minor differences in non-hydrogen atom positions suggest that characterization of a complete crystal structure by X-ray powder diffraction may be feasible.
Journal ArticleDOI

Effects of Layer Stacking on the Combination Raman modes in Graphene

TL;DR: In this paper, the authors have observed new combination modes in the range from 1650 - 2300 cm-1 in single-(SLG), bi-, few-layer and incommensurate bilayer graphene (IBLG) on silicon dioxide substrates.