D
Doron Naveh
Researcher at Bar-Ilan University
Publications - 60
Citations - 2870
Doron Naveh is an academic researcher from Bar-Ilan University. The author has contributed to research in topics: Graphene & Band gap. The author has an hindex of 19, co-authored 50 publications receiving 2284 citations. Previous affiliations of Doron Naveh include Weizmann Institute of Science & Carnegie Mellon University.
Papers
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Tunable band gaps in bilayer transition-metal dichalcogenides
TL;DR: In this article, the authors investigate band-gap tuning in bilayer transition-metal dichalcogenides by external electric fields applied perpendicular to the layers, and show that the fundamental band gap of MoS, MoSe, MoTe, and WS bilayer structures continuously decreases with increasing applied electric fields, eventually rendering them metallic.
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Mn-doped monolayer MoS 2 : An atomically thin dilute magnetic semiconductor
TL;DR: In this article, the electronic and magnetic properties of Mn-doped monolayer MoS were investigated using a combination of first-principles density functional theory (DFT) calculations and Monte Carlo simulations.
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Widely tunable black phosphorus mid-infrared photodetector
Xiaolong Chen,Xiaobo Lu,Bingchen Deng,Ofer Sinai,Yuchuan Shao,Cheng Li,Shaofan Yuan,Vy Tran,Kenji Watanabe,Takashi Taniguchi,Doron Naveh,Li Yang,Fengnian Xia +12 more
TL;DR: It is shown that a vertical electric field can dynamically extend the photoresponse in a 5 nm-thick BP photodetector from 3.7 to beyond 7.7 μm, opening the doors to various mid-infrared applications.
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Tunable band gaps in bilayer graphene-BN heterostructures
TL;DR: The calculations suggest that graphene-boron nitride heterostructures could provide a viable route to graphene-based electronic devices.
Journal Article
Tunable band gaps in bilayer graphene-BN heterostructures
TL;DR: In this article, the band gap tuning of bilayer graphene between hexagonal boron nitride sheets, by external electric fields, was investigated and it was shown that the gap is continuously tunable from 0 to 0.2 eV and is robust to stacking disorder.