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Douglas H. Lowndes

Researcher at Oak Ridge National Laboratory

Publications -  126
Citations -  6166

Douglas H. Lowndes is an academic researcher from Oak Ridge National Laboratory. The author has contributed to research in topics: Thin film & Carbon nanofiber. The author has an hindex of 38, co-authored 126 publications receiving 5996 citations. Previous affiliations of Douglas H. Lowndes include Battelle Memorial Institute & Baylor University.

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Patent

Nanostructure field emission cathode material within a device

TL;DR: Gated field emission devices and systems and methods for their fabrication are described in this article, where a method for growing a substantially vertically aligned carbon nanostructure coupled to a substrate is described.
Journal ArticleDOI

Enhanced metal-ceramic adhesion by sequential sputter deposition and pulsed laser melting of copper films on sapphire substrates

TL;DR: In this paper, the effect of pulsed XeCl (308 nm) laser treatment on the adhesion between sputter-deposited copper films and sapphire substrates is presented.
Journal ArticleDOI

Pulsed-Laser Annealing of Ion-Implanted GaAs: Theory and Exeriment

TL;DR: Good agreement between theory and experiment is also obtained for dopant profile spreading during pulsed-laser annealing as discussed by the authors, and good agreement is obtained between measured and calculated thresholds for melting, for catastrophic damage due to vaporization, and for the duration of surface melting at various energy densities.
Proceedings ArticleDOI

Effects of laser and particle beams on the synthesis and nonlinear optical response of nanostructures

TL;DR: In this paper, the authors investigated several ways in which laser and ion-beam processing can be used to create vertically and/or laterally patterned nanostructured composite materials, and they considered the use of lasers in conjunction with laser or particle-beam-created surface defects to serve as distributed nucleation sites for quantum dot growth.
Journal ArticleDOI

Pulsed Ruby Laser Annealing of Zn, Mg, Se and Si Ion Implants in Semiconducting GaAs

TL;DR: In this paper, the properties of p+ and n+ layers formed by pulsed ruby laser annealing (PRLA) of shallow implantations of Mg, Zn, Si and Se ions in both n-and p-type semiconducting GaAs have been evaluated using a combination of SIMS and electrical properties measurements.