E
Eric W. Van Stryland
Researcher at University of Central Florida
Publications - 298
Citations - 8012
Eric W. Van Stryland is an academic researcher from University of Central Florida. The author has contributed to research in topics: Two-photon absorption & Absorption (electromagnetic radiation). The author has an hindex of 49, co-authored 298 publications receiving 7450 citations. Previous affiliations of Eric W. Van Stryland include National University of Colombia & University of North Texas.
Papers
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Journal ArticleDOI
Two-Photon Absorption, Nonlinear Refraction and Optical Limiting in Semiconductors
Eric W. Van Stryland,Herman Vanherzeele,M. A. Woodall,M. J. Soileau,Arthur L. Smirl,Shekhar Guha,Thomas F. Boggess +6 more
TL;DR: In this paper, the authors measured two-photon absorption coefficients of 10 direct gap semiconductors with band-gap energy Eg varying between 1.4 and 3.7 eV using 1.06 µm and 0.53 um picosecond pulses.
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Multiphoton‐absorbing organic materials for microfabrication, emerging optical applications and non‐destructive three‐dimensional imaging
TL;DR: In this paper, the authors defined non-resonant two-photon absorption (TPA) as the simultaneous absorption of two photons, via a virtual state, in a medium TPA exhibits a quadratic dependence of absorption on the incident light intensity, resulting in highly localized photoexcitation.
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Nonlinear refraction and absorption: mechanisms and magnitudes
Demetrios N. Christodoulides,Iam-Choon Khoo,Gregory J. Salamo,George I. Stegeman,Eric W. Van Stryland +4 more
TL;DR: In this article, the authors provide an in-depth treatment of the various mechanisms by which an incident light beam can produce an intensity- or flux-dependent change in the refractive index and absorption coefficient of different materials.
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Large nonlinear phase shifts in second-order nonlinear-optical processes.
TL;DR: It is shown that processes such as second-harmonic generation and subsequent downconversion, and parametric mixing in general, can lead to large field-dependent phase shifts for the input beams under a variety of conditions.
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Nonlinear refraction and optical limiting in thick media
TL;DR: In this paper, a simple model based on the "constant shape approximation" is used for analyzing the propagation of laser beams within nonlinear refractive materials under most conditions, and the position of the sample with respect to the focal plane, z, is an important parameter in the fluence limiting characteristics of the output.