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Ghulam Muhammad

Researcher at King Saud University

Publications -  387
Citations -  13096

Ghulam Muhammad is an academic researcher from King Saud University. The author has contributed to research in topics: Computer science & Deep learning. The author has an hindex of 49, co-authored 341 publications receiving 7851 citations.

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Performance Evaluation of Bangla Word Recognition Using Different Acoustic Features

TL;DR: It is shown that MFCC based method of 39 dimensions provides a higher word correct rate (WCR) than the other methods investigated and a higher WCR is obtained by the MFCC39-based method with fewer mixture components in the HMM.
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Incentive mechanism for collaborative distributed learning in Artificial Intelligence of Things

TL;DR: In this article, a collaborative distributed learning has been proposed to let the clients collaboratively train a machine learning model together with their local data in a distributed manner, where multiple parameter servers (PSs) compete with each other to motivate clients to contribute model training.
Journal Article

Evaluation of non -antibiotics alone and in combination with cephradine in the cure rates in clinical bubaline mastitis

TL;DR: All non-antibiotic antibacterials exhibited a synergy with cephradine (Ceph), so on day 14 post initiation of treatment, SFMT based cure rates in quarters treated with CPZ, Lid, PI, and DMSO + Ceph were 66.6%, almost similar to those recorded with SFMT on the corresponding time points.
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Isolation and Identification of Salmonella paratyphi from Enteric Fever Patients at Different Hospitals of Quetta City.

TL;DR: To control paratyphoid fever strong initiatives must be taken to improve water sanitation, hygiene level, supply of save drinking water and vaccination is recommended in order to eradicate the disease.
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Impact of Ar Flow Rates on Micro-Structural Properties of WS2 Thin Film by RF Magnetron Sputtering.

TL;DR: In this article, the effect of Ar flow rates on the structural, morphology, and electrical properties of Tungsten disulfide (WS2) thin films was investigated thoroughly, which indicated that Ar gas flow rate is one of the important process parameters in RF magnetron sputtering that could affect the morphology, electrical properties, and structural properties of WS2 thin film.