H. Launois

TL;DR: In this article, an array of micron size perpendicularly magnetized ultrathin Co dots with 20 nm separation was obtained using ion irradiation by a focused ion beam and studied by polar magneto-optical microscopy.

TL;DR: In this article, a planar technology was developed to pattern the magnetic properties of multilayers by irradiation through a lithographically defined mask, without significant changes in sample roughness or optical properties.

TL;DR: In this paper, a statistical model was developed, assuming an intrinsic distribution of nucleation sites in the initially continuous film, a uniform nucleation volume, and a linear dependence of the nucleation energy barrier on both applied field and nucleation field at a given site.

TL;DR: In this paper, the authors report on replication of high resolution patterns over a 4 in. wafer area by imprint lithography with a commercial hydraulic press and a pair of hot plates.

TL;DR: In this article, a technology of proximity x-ray lithography has been developed to replicate patterns of sub-100-nm feature size using synchrotron radiation, and the results are analyzed in terms of a scaling rule to evaluate the resolution limit as a function of proximity gap.