scispace - formally typeset
H

Hans Hilgenkamp

Researcher at MESA+ Institute for Nanotechnology

Publications -  209
Citations -  10437

Hans Hilgenkamp is an academic researcher from MESA+ Institute for Nanotechnology. The author has contributed to research in topics: Superconductivity & Josephson effect. The author has an hindex of 45, co-authored 203 publications receiving 9757 citations. Previous affiliations of Hans Hilgenkamp include National University of Singapore & German National Metrology Institute.

Papers
More filters
Journal ArticleDOI

Temperature dependence measurements of the supercurrent-phase relationship in niobium nanobridges

TL;DR: In this article, a deformation from Josephson-like sinusoidal characteristics at high temperatures to sawtooth shaped curves at intermediate and multivalued relationships at low temperatures was observed.
Journal ArticleDOI

Phase-sensitive order parameter symmetry test experiments utilizing Nd(2-x)Ce(x)CuO(4-y)/Nb zigzag junctions.

TL;DR: Phase-sensitive order parameter symmetry test experiments are presented on the electron-doped high-T(c) cuprate Nd(2-x)Ce(x)CuO(4-y) using zigzag-shaped thin film Josephson structures, presenting no indications for a change to a predominant s-wave symmetry with decreasing temperature.
Journal ArticleDOI

Observation of splintered Josephson vortices at grain boundaries in YBa2Cu3O7-d

TL;DR: In this article, the authors directly observed well separated Josephson vortex splinters with unquantized magnetic flux at asymmetric 45° grain boundaries in YBa2Cu3O7-? films by imaging magnetic flux with scanning SQUID microscopy.
Journal ArticleDOI

Antiferromagnetic ordering in arrays of superconducting pi-rings

TL;DR: In this article, the cooling process of YBa2Cu3O7?delta-Nb pi-rings is modeled with a numerical solution of the Sine-Gordon equation.
Journal ArticleDOI

Enhanced transparency ramp-type Josephson contacts through interlayer deposition

TL;DR: In this paper, a thin interlayer is incorporated in ramp-type Josephson junctions to obtain an increased transparency, restoring the surface damaged by ion milling and leading to clean and well-defined interfaces.