H
Hideaki Adachi
Researcher at Panasonic
Publications - 233
Citations - 4161
Hideaki Adachi is an academic researcher from Panasonic. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 33, co-authored 233 publications receiving 4046 citations. Previous affiliations of Hideaki Adachi include Nara Institute of Science and Technology.
Papers
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Ferroelectric (Pb,La)(Zr,Ti)O3 epitaxial thin films on sapphire grown by rf-planar magnetron sputtering
TL;DR: In this paper, Ferroelectric (Pb,La,Zr,Ti)O3 (PLZT) thin films have been epitaxially grown on the c plane of sapphire by rf-planar magnetron sputtering.
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Colossal electroresistance of a Pr 0.7 Ca 0.3 Mn O 3 thin film at room temperature
A. Odagawa,Hiroshi Sato,Isao H. Inoue,Hiroshi Akoh,Masashi Kawasaki,Yoshinori Tokura,Tsutomu Kanno,Hideaki Adachi +7 more
TL;DR: In this article, the electronic conduction through a semiconducting thin film is investigated by measurements using dc and pulsed biases, and the observed conduction characteristics exhibit the space-charge-limited current effect, and can be ascribed to a carrier trapping and detrapping of the trap sites in the manganite.
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PLZT thin-film waveguides
TL;DR: PLZT thin-film channel waveguides have been successfully formed in ridges by an ion-beam etching process and it was confirmed that PLZT channel waves were much more efficient than conventional Ti-diffused LiNbO3 waveguide.
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Low‐temperature process for the preparation of high Tc superconducting thin films
TL;DR: In this article, a low-temperature process for the preparation of high Tc superconducting films by rf magnetron sputtering was established, which prevented diffusion at the film and substrate interface and reduced the porous structure in the films.
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Electro‐optic effects of (Pb, La)(Zr, Ti)O3 thin films prepared by rf planar magnetron sputtering
TL;DR: In this paper, a high quadratic electrooptic coefficient of 0.8×10−16 (m/V)2 was obtained at 6328 A. The rf planar magnetron sputtering process improved the quality of the thin-film integrated optic devices.