H
Howard R. Huff
Researcher at SEMATECH
Publications - 72
Citations - 1357
Howard R. Huff is an academic researcher from SEMATECH. The author has contributed to research in topics: Gate dielectric & High-κ dielectric. The author has an hindex of 20, co-authored 72 publications receiving 1306 citations.
Papers
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Gate stack technology for nanoscale devices
TL;DR: In this article, the current status of and challenges in gate stack research for planar CMOS devices and alternative device technologies are reviewed to provide insights for future research, but many challenges remain before alternative gate stacks can be introduced into mainstream technology.
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Dielectrics for future transistors
TL;DR: The general direction of this trend is scaling down the critical transistor dimensions of integrated circuit (IC) components as mentioned in this paper, which can be classified into two categories: high transistor densities and faster transistors.
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Interfacial Layer-Induced Mobility Degradation in High-k Transistors
Gennadi Bersuker,Joel Barnett,Naim Moumen,Brendan Foran,Chadwin D. Young,Patrick S. Lysaght,Jeff J. Peterson,Byoung Hun Lee,Peter Zeitzoff,Howard R. Huff +9 more
TL;DR: In this paper, high-k deposition on thinner SiO2 films, below 1.1 nm, may lead to the formation of a highly oxygen deficient amorphous interfacial layer adjacent to the Si substrate.
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Experimental observations of the thermal stability of high-k gate dielectric materials on silicon
TL;DR: In this paper, high-k dielectric materials including zirconium oxide and hafnium oxide produced by atomic layer deposition have been evaluated for thermal stability using analyses derived from X-ray diffraction (XRD), Xray reflectometry (XRR), medium energy ion spectroscopy, high resolution transmission electron microscopy (HRTEM), tunneling atomic force microscopy, scanning electron microscopes, Auger electron spectroscope and secondary ion mass spectrography.