Huije Ryu

TL;DR: An atomically thin graphene etch stop is demonstrated for patterning van der Waals heterostructures through the selective etch of two-dimensional materials with xenon difluoride gas and a selective etching method using XeF2 gas is reported to achieve 1D contacts with low contact resistivity.

TL;DR: A new compound material of 2D hydrofluorinated graphene (HFG) is demonstrated whose relative hydrogen/fluorine concentrations can be tailored between the extremes of either hydrogenated graphene (HG) and fluorinate graphene (FG).

TL;DR: In this article, the second sentence of the second paragraph of the ‘Electrical properties of fluorinated graphene contacts’ section of the Results, which incorrectly read ‘The mobility was calculated by the Drude model, where μ, n, e, and σ are the carrier mobility, carrier density, electron charge, and sheet conductivity, respectively’.

TL;DR: This work demonstrates a method to fabricate single- or double-sided fluorinated bilayer graphene (FBG) by tailoring substrate interactions and defines a straightforward method to selectively functionalize the top and bottom surfaces of bilayers graphene.