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Igor Turovets
Researcher at Weizmann Institute of Science
Publications - 22
Citations - 200
Igor Turovets is an academic researcher from Weizmann Institute of Science. The author has contributed to research in topics: Metrology & Dimensional metrology. The author has an hindex of 6, co-authored 22 publications receiving 161 citations.
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Proceedings ArticleDOI
A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM
Alok Vaid,Bin Bin Yan,Yun Tao Jiang,Mark Kelling,Carsten Hartig,John Allgair,Peter Ebersbach,Matthew Sendelbach,Narender Rana,Ahmad D. Katnani,Erin Mclellan,Chas Archie,Cornel Bozdog,Helen Kim,Michael Sendler,Susan Ng,Boris Sherman,Boaz Brill,Igor Turovets,Ronen Urensky +19 more
TL;DR: The Hybrid Metrology approach is defined to be the use of any two or more metrology toolsets in combination to measure the same dataset to optimize metrology recipe and improve measurement performance.
Journal ArticleDOI
Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope
Alok Vaid,Bin Bin Yan,Yun Tao Jiang,Mark Kelling,Carsten Hartig,John Allgair,Peter Ebersbach,Matthew Sendelbach,Narender Rana,Ahmad D. Katnani,Erin Mclellan,Charles N. Archie,Cornel Bozdog,Helen Kim,Michael Sendler,Susan Ng,Boris Sherman,Boaz Brill,Igor Turovets,Ronen Urensky +19 more
TL;DR: This work defines "hybrid metrology" to be the use of any two or more metrology toolsets in combination to measure the same dataset and demonstrates the benefits of the hybrid metrology on two test structures.
Proceedings ArticleDOI
Hybrid metrology solution for 1X node technology
Alok Vaid,Alexander Elia,Mark Kelling,John Allgair,Carsten Hartig,Peter Ebersbach,Erin Mclellan,Matthew Sendelbach,Nedal R. Saleh,Narender Rana,Hiroki Kawada,Toru Ikegami,Masahiko Ikeno,Takahiro Kawasaki,Cornel Bozdog,Helen Kim,Elad Arnon,Roy Koret,Igor Turovets +18 more
TL;DR: This paper extends previous work on HM to measure advanced 1X node layers - EUV and Negative Tone Develop (NTD) resist as well as 3D etch structures such as FinFETs and investigates hybrid calibration of CDSEM to measure in-die resist line height by Pattern Top Roughness (PTR) methodology.
Proceedings ArticleDOI
OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation
Daniel Schmidt,Curtis Durfee,Shanti Pancharatnam,Manasa Medikonda,Andrew M. Greene,Frougier Julien,Aron Cepler,Gilad Belkin,Dror Shafir,Roy Koret,Roy Shtainman,Igor Turovets,Shay Wolfling +12 more
TL;DR: In this article, Spectral Interferometry enhanced OCD capabilities were demonstrated for one of the most critical and challenging applications of gate-all-around nanosheet device manufacturing: lateral etching of SiGe nano-heels to form inner spacer indentations.
Proceedings ArticleDOI
Hybrid approach to optical CD metrology of directed self-assembly lithography
Stephane Godny,Masafumi Asano,Akiko Kawamoto,Koichi Wakamoto,Kazuto Matsuki,Cornel Bozdog,Matthew Sendelbach,Igor Turovets,Ronen Urenski,Renan Milo +9 more
TL;DR: In this paper, a multichannel spectroscopic reflectometry (SR) system was used for direct self assembly (DSA) contact metrology, where guide CD, polymer CD, and residual polymer thickness at the bottom of the guide cavity were measured using optical CD.