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In-jun Hwang
Researcher at Samsung
Publications - 31
Citations - 681
In-jun Hwang is an academic researcher from Samsung. The author has contributed to research in topics: Layer (electronics) & High-electron-mobility transistor. The author has an hindex of 11, co-authored 28 publications receiving 560 citations.
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Patent
Power device and method of manufacturing the same
TL;DR: In this article, a power device includes a substrate, a nitride-containing stack on the substrate, and an electric field dispersion unit between the substrate and the first region of the nitridecontaining stack.
Journal ArticleDOI
Estimation of Short Circuit Capability of GaN HEMTs Using Transient Measurement
In-jun Hwang,Soogine Chong,Dong-Chul Shin,Sun-Kyu Hwang,Young-Hwan Park,Bo-Ram Kim,Joonyong Kim,Jae-joon Oh,Jun Hyuk Park,Min Chul Yu,Woo-Chul Jeon,Jai-Kwang Shin,Jongseob Kim +12 more
TL;DR: Wafer level transient voltage measurement (WLTVM) is suggested in this article to estimate the short circuit capability of AlGaN/GaN HEMT devices, and two groups of samples with similar DC and switching properties but different short circuit capabilities of 4-7 and $>{10}\mu \text{s}$ were evaluated.
Patent
High electron mobility transistors exhibiting dual depletion and methods of manufacturing the same
TL;DR: In this paper, a dual depletion region (AZ) exists between the source electrode and the drain electrode in a high electron mobility transistors (HEMT) exhibiting dual depletion and methods of manufacturing the same.
Patent
High electron mobility transistor having reduced threshold voltage variation and method of manufacturing the same
TL;DR: In this article, a transistor includes a channel layer on a substrate, a first channel supply layer on the channel, a depletion layer, a second Channel supply layer, source and drain electrodes on the first channel, and a gate electrode on the depletion layer.
Journal ArticleDOI
Impacts of fluorine on GaN high electron mobility transistors: Theoretical study
TL;DR: In this article, the role of fluorine (F) in GaN-based high electron mobility transistors (HEMTs) with first principle calculations is investigated, and the degradation of device performance at high temperature is ascribed to the defect energy state near conduction band edge of FN.