J
J. Tracy Weed
Researcher at IBM
Publications - 5
Citations - 206
J. Tracy Weed is an academic researcher from IBM. The author has contributed to research in topics: Aerial image & Stepper. The author has an hindex of 5, co-authored 5 publications receiving 205 citations.
Papers
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Patent
Continuous scale optical proximity correction by mask maker dose modulation
TL;DR: In this article, the authors proposed a method based on coding of relative dose information onto the design data, which allows continuous scale line width variation for all features without impact to data volume.
Journal ArticleDOI
Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS
Russell A. Budd,Derek B. Dove,John L. Staples,Ronald M. Martino,Richard A. Ferguson,J. Tracy Weed +5 more
Proceedings ArticleDOI
Application of the aerial image measurement system (AIMS)TM to the analysis of binary mask imaging and resolution enhancement techniques
Ronald M. Martino,Richard A. Ferguson,Russell A. Budd,John L. Staples,Lars W. Liebmann,Antoinette F. Molless,Derek B. Dove,J. Tracy Weed +7 more
TL;DR: In this article, the newly developed Aerial Image Measurement System (AIMSTM*) was used to quantify the lithographic benefits of several resolution enhancement techniques as compared to standard binary mask imaging.
Proceedings ArticleDOI
Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designs
Lars W. Liebmann,Thomas Harold Newman,Richard A. Ferguson,Ronald M. Martino,Antoinette F. Molless,Mark O. Neisser,J. Tracy Weed +6 more
TL;DR: In this article, a comparative analysis of binary 'chrome-on-glass', attenuated, biased rim, and phase edge shifted DUV lithography solutions for advanced circuitry in the sub-250 nm image size regime is presented.
Proceedings ArticleDOI
Application of an aerial image measurement system to mask fabrication and analysis
Richard A. Ferguson,Ronald M. Martino,Russell A. Budd,John L. Staples,Lars W. Liebmann,Derek B. Dove,J. Tracy Weed +6 more
TL;DR: In this paper, the AIMS tool was applied during the implementation of an alternating phase-shift mask (PSM) fabrication process in order to understand the impact of the etched-quartz sidewall on lithographic performance.