J
James H. Underwood
Researcher at Lawrence Berkeley National Laboratory
Publications - 126
Citations - 2619
James H. Underwood is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Extreme ultraviolet lithography & Synchrotron radiation. The author has an hindex of 26, co-authored 126 publications receiving 2563 citations. Previous affiliations of James H. Underwood include California Institute of Technology.
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Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance.
TL;DR: The theory of x-ray diffraction by periodic structures is applied to LSMs, and approximate formulas for estimating their performance are presented and it is shown that, by adjusting the refractive indices and thicknesses of the component layers, the diffracting properties may be tailored to specific applications.
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Electronic states in valence and conduction bands of group-III nitrides: Experiment and theory
K. Lawniczak-Jablonska,Tadeusz Suski,I. Gorczyca,N. E. Christensen,Klaus Attenkofer,Rupert C. C. Perera,Eric M. Gullikson,James H. Underwood,David L. Ederer,Z. Liliental Weber +9 more
TL;DR: In this paper, a comprehensive study of the electronic structure of group-III nitrides (AlN, GaN, InN, and BN) crystallizing in the wurtzite, zinc-blende, and graphitelike hexagonal (BN) structures is presented.
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Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet.
Kenneth M. Skulina,C S Alford,Richard M. Bionta,D. M. Makowiecki,Eric M. Gullikson,Regina Soufli,Jeffrey B. Kortright,James H. Underwood +7 more
TL;DR: This work reports on a series of normal-incidence reflectance measurements at wavelengths just longer than the beryllium K-edge from molybdenum/beryllium multilayer mirrors that are to be demonstrated in the 1-80-nm spectral range.
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Resolving power of 35,000 (5 mA) in the extreme ultraviolet employing a grazing incidence spectrometer
TL;DR: The performance of a high-resolution spectrometer employing a varied line-space plane reflection grating is measured.
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Calibration and standards beamline 6.3.2 at the Advanced Light Source
James H. Underwood,Eric M. Gullikson,Masato Koike,Phillip J. Batson,P.E. Denham,K.D. Franck,Ron E. Tackaberry,W.F. Steele +7 more
TL;DR: The bending magnet beamline has been in operation since February 1995 for the characterization of optical elements (mirrors, gratings, multilayers, detectors, etc.) in the energy range 50-1000 eV.