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Jean Pierre Nozieres

Researcher at Centre national de la recherche scientifique

Publications -  55
Citations -  1473

Jean Pierre Nozieres is an academic researcher from Centre national de la recherche scientifique. The author has contributed to research in topics: Magnetization & Coercivity. The author has an hindex of 19, co-authored 55 publications receiving 1426 citations. Previous affiliations of Jean Pierre Nozieres include French Alternative Energies and Atomic Energy Commission.

Papers
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Excitations of incoherent spin-waves due to spin-transfer torque.

TL;DR: In this article, the authors point out the key role played by incoherent spin-wave excitation due to spin-transfer torque, which is caused by spatial inhomogeneities in local fields generating distributions of local precession frequencies.
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Excitations of incoherent spin-waves due to spin-transfer torque

TL;DR: The key role played by incoherent spin-wave excitation due to spin-transfer torque is pointed out and the incoherence is caused by spatial inhomogeneities in local fields generating distributions of local precession frequencies.
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Thermally assisted switching in exchange-biased storage layer magnetic tunnel junctions

TL;DR: In this article, a thermally assisted writing procedure is proposed in a tunnel junction based magnetic random access memory cell, where the magnetic layers of the tunnel junction are both exchange-biased with antiferromagnetic layers, the reference layer having a much higher blocking temperature than the storage layer.
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Thermally assisted MRAMs: ultimate scalability and logic functionalities

TL;DR: In this article, the authors used the heating produced by Joule dissipation around the tunnel barrier of magnetic tunnel junctions (MTJ) to assist writing in MRAMs.
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Magnetostatic interactions between magnetic arrays and superconducting thin films

TL;DR: In this paper, two-dimensional arrays of amorphous Gd-Co square particles with thickness around 200 nm were fabricated on 20 nm thick Nb films by means of high-resolution e-beam lithography and sputter deposition.