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Jo Robbelein

Researcher at Katholieke Universiteit Leuven

Publications -  24
Citations -  395

Jo Robbelein is an academic researcher from Katholieke Universiteit Leuven. The author has contributed to research in topics: Solar cell & Silicon. The author has an hindex of 11, co-authored 24 publications receiving 376 citations. Previous affiliations of Jo Robbelein include IMEC.

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Stress-induced large-area lift-off of crystalline Si films

TL;DR: In this article, a new implantation-free lift-off process is presented, where a layer with mismatched thermal expansion coefficient with respect to the substrate is deposited, and upon cooling, the differential contraction induces a large stress field which is released by the initiation and the propagation of a crack parallel to the surface.
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Simple power-loss analysis method for high-efficiency Interdigitated Back Contact (IBC) silicon solar cells

TL;DR: In this article, a simple analytical method is presented to perform a power-loss analysis of high-efficiency silicon Interdigitated Back Contact (IBC) solar cells, which assumes one-dimensional current flows for both minority and majority carriers, as well as a constant gradient (or linear profile) of minority carrier concentration from the front to the back of the solar cell.
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Screen-Printed Aluminum-Alloyed $\hbox{P}^{+}$ Emitter on High-Efficiency N-Type Interdigitated Back-Contact Silicon Solar Cells

TL;DR: In this paper, the use of industrial-oriented screen-printed aluminum-alloyed emitter for high-efficiency n-type interdigitated back-contact silicon solar cells was demonstrated.
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Development and Integration of a High Efficiency Baseline Leading to 23% IBC Cells

TL;DR: In this paper, the authors present the development of single step processes and their integration into a baseline for the lab scale manufacturing of high efficiency IBC cells, including cleaning, oxidation, boron and phosphorous doping.
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Studies of implanted boron emitters for solar cell applications

TL;DR: In this article, B implanted emitters are investigated in the back junction cell configuration and their material properties are tested in double side implanted Si wafers, where BnIm clusters formation is correlated with lifetime degradation.