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Joachim Schulz

Researcher at European XFEL

Publications -  169
Citations -  8823

Joachim Schulz is an academic researcher from European XFEL. The author has contributed to research in topics: Laser & LIGA. The author has an hindex of 41, co-authored 158 publications receiving 8048 citations. Previous affiliations of Joachim Schulz include University of Oulu & University of Hamburg.

Papers
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Journal ArticleDOI

Metrology study of high precision mm parts made by the deep x-ray lithography (LIGA) technique

TL;DR: In this article, a coordinate measurement machine equipped with an optical fiber probe was used to measure the precision and accuracy of microstructures produced by the Institute of Microstructure Technology, Karlsruhe.
Journal ArticleDOI

Core-hole-induced degeneracy of the valence subshells in the 5p photoemission of atomic europium

TL;DR: In contrast to the expected simple multiplet structure of a ${5p}^{\ensuremath{-}1}{4f}^{7}{(}^{8}S)$ configuration with six main lines, the observed Eu photoemission spectrum of atomic europium has a very complex spectrum.
Patent

Phase shifting device, and laser resonator for generating radially or azimuthally polarized laser radiation

TL;DR: In this article, a phase shifting device (42') was proposed for stabilizing radially or azimuthally polarized laser radiation within a laser resonator (40') that comprises a polarizer device for generating a phase difference (Δφ) ranging from about 30° to about 330°.
Journal ArticleDOI

Shake-up satellites accompanying the inner shell ionization of alkali atoms

TL;DR: In this article, the shakeup probabilities of the outermost electron in inner shell ionization and subsequent Auger decay of alkali atoms have been studied in the sudden approximation model using the wavefunctions obtained with the multiconfiguration Dirac-Fock (MCDF) method.
Proceedings ArticleDOI

Simulation of structure profiles in optical lithography of thick DNQ-novolak-based photoresists

TL;DR: In this paper, the vertical distribution of residual solvent concentration was calculated by modeling the evaporation during pre-bake as a three step process: diffusion of solvent within the resist film to the surface, a transfer to the ambient air described by a phase equilibrium and a transport away from the surface described by convection.