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John G. Shaw

Researcher at PARC

Publications -  18
Citations -  473

John G. Shaw is an academic researcher from PARC. The author has contributed to research in topics: Amorphous silicon & Thin-film transistor. The author has an hindex of 10, co-authored 18 publications receiving 464 citations. Previous affiliations of John G. Shaw include Xerox.

Papers
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A new analytic model for amorphous silicon thin‐film transistors

TL;DR: In this paper, a new theory describing currentvoltage characteristics of amorphous silicon thin-film transistors is presented, where drain current is expressed through the free-carrier concentration at the source side of the channel.
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An analytic model for calculating trapped charge in amorphous silicon

TL;DR: In this paper, a simple analytic model for calculating the trapped charge density as a function of free-carrier concentration for realistic density-of-states distributions in hydrogenated amorphous silicon was presented.
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Physical models for amorphous-silicon thin-film transistors and their implementation in a circuit simulation program

TL;DR: In this paper, a semianalytic theory to describe both the currentvoltage and capacitance-voltage characteristics of amorphous silicon thin-film transistors on the basis of their physics of operation is presented.
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Simulations of short‐channel and overlap effects in amorphous silicon thin‐film transistors

TL;DR: In this article, the authors compared the performance of thin-film transistors with and without overlaps as a function of gate length and showed that charge accumulates under the drain overlap shortening the effective channel length.
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Capacitance‐voltage characteristics of amorphous silicon thin‐film transistors

TL;DR: In this article, the authors present the results of experimental and theoretical studies of capacitance-voltage characteristics of amorphous silicon thin-film transistors and calculate small signal capacitances as derivatives of channel charge with respect to terminal voltages.