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Jong-Keuk Park

Researcher at Korea Institute of Science and Technology

Publications -  57
Citations -  841

Jong-Keuk Park is an academic researcher from Korea Institute of Science and Technology. The author has contributed to research in topics: Thin film & Electrode. The author has an hindex of 14, co-authored 55 publications receiving 706 citations. Previous affiliations of Jong-Keuk Park include Seoul National University.

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Large enhancement in mechanical properties of the 6061 Al alloys after a single pressing by ECAP

TL;DR: In this article, the equal channel angular pressed (ECAPed) 6061 Al alloys processed with various pre- and post-ECAP heat treatments were compared in terms of the balance between strength and tensile ductility.
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The crystalline structure, hardness and thermal stability of AlN/CrN superlattice coating prepared by D.C. magnetron sputtering

TL;DR: In this paper, AlN/CrN nanoscale multilayered superlattice coatings have been deposited on M2 HSS by reactive D.C. magnetron sputtering with Al and Cr targets under Ar and N2 atmosphere.
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Effect of post equal-channel-angular-pressing aging on the modified 7075 Al alloy containing Sc

TL;DR: In this article, the effect of post-ECAP low-temperature aging on mechanical properties of the 7075 Al aluminum alloy containing Sc (7×51) after a single pressing was examined.
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Plasma functionalization for cyclic transition between neutral and charged excitons in monolayer MoS2.

TL;DR: It is found that despite their strong adhesion, a post hydrogen plasma treatment can very effectively dedope chlorine adatoms in a controllable way while maintaining robust structural integrity, which enables well-defined reversible PL control of 1L-MoS2.
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Exploring dopant effects in stannic oxide nanoparticles for CO2 electro-reduction to formate

TL;DR: In this article , a fluorine-doped tin oxide catalyst was used to achieve a high Faradaic efficiency for formate (95% at 100 mA cm-2) and a maximum partial current density of 330mA cm −2 (at 400 m −2) for electroreduction of CO2.