J
Joseph P. Dougherty
Researcher at Pennsylvania State University
Publications - 55
Citations - 1157
Joseph P. Dougherty is an academic researcher from Pennsylvania State University. The author has contributed to research in topics: Dielectric & Thin film. The author has an hindex of 18, co-authored 55 publications receiving 1116 citations. Previous affiliations of Joseph P. Dougherty include Philips & City College of New York.
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Silver-Palladium Thick-Film Conductors
TL;DR: In this article, the performance and properties of fired Ag/Pd films are discussed through their physical and chemical aspects The final film properties are correlated to a number of factors, including thermodynamics and kinetics of Pd oxidation during burnout and firing; chemical and physical reaction of the Ag/pd with the ceramic substrate, organic vehicle, and solder; Ag diffusion and migration; inorganic and organic additives; powders characteristics; and paste properties
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Structure property relationships in core-shell BaTiO3—LiF ceramics
TL;DR: In this paper, a sintering, microstructural development and dielectric property study of BaTiO3-LiF ceramics was performed to assess the potential application of low-fired multilayer capacitors.
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Electrochemical, hydrothermal, and electrochemical-hydrothermal synthesis of barium titanate thin films on titanium substrates
TL;DR: In this article, well-crystallized polycrystalline films of cubic BaTiO3 have been synthesized on Ti metal substrates by electrochemical, hydrothermal, and electrochemical-hydrothermal reaction of a Ti metal with a saturated solution of Ba(OH)2 in the temperature range 80 °C−200 °C.
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Particle and grain size effects on the dielectric behavior of the relaxor ferroelectric Pb(Mg1/3Nb2/3)O3
TL;DR: In this paper, the role of particle and grain size on the dielectric behavior of perovskite relaxor ferroelectric Pb(Mg1/3Nb2/3)O3 [PMN] was investigated.
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Reactive magnetron co-sputtered antiferroelectric lead zirconate thin films
TL;DR: In this paper, a reactive magnetron co-sputtering method was used to form antiferroelectric lead zirconate thin films on platinum-coated silicon substrates.