A surgical stapling device for applying an array of surgical staples to tissue is provided. The stapling device includes an approximation mechanism for moving a cartridge assembly and an anvil assembly between spaced and approximated positions and a firing mechanism for ejecting the array of staples from the cartridge assembly. A single trigger is operable to effect approximation and firing of the device. The device also includes an alignment pin assembly which can be selectively manually or automatically advanced. The anvil assembly includes a stiffener plate which allows the device to have a reduced head portion profile.

Surgical stapling device

An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.

Semiconductor device, and manufacturing method thereof

A polymer composition includes a conductive polymer and at least one stretchability and electrical conductivity (STEC) enhancer, wherein a content of the STEC enhancer in the composition is at least about 1 wt.% of the composition.

Highly stretchable, transparent, and conductive polymer

Process gas discharged from a bypass pipe to a gas exhaust system can be prevented from diffusing back to the inside of a process chamber without having to install a dedicated vacuum pump at the downstream side of the bypass pipe. The substrate processing apparatus includes a process chamber accommodating a substrate, a gas supply system supplying process gas from a process gas source to the process chamber for processing the substrate, a gas exhaust system configured to exhaust the process chamber, two or more vacuum pumps installed in series at the gas exhaust system, and a bypass pipe connected between the gas supply system and the gas exhaust system. The most upstream one of the vacuum pumps is a mechanical booster pump, and the bypass pipe is connected between the mechanical booster pump and the rest vacuum pumps located at a downstream side of the mechanical booster pump.

Substrate Processing Apparatus

A positive resist composition comprising: at least one compound selected from a compound capable of generating an acid represented by the formula (I) as defined herein upon irradiation with actinic rays or radiation and a compound capable of generating an acid represented by the following formula (II) upon irradiation with actinic rays or radiation; and a compound capable of generating an acid represented by the formula (III) as defined herein upon irradiation with actinic rays or radiation.

Positive resist composition and pattern-forming method using the same

A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high resolution and improved LER.

Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound

【課題】導電性及び生体適合性に優れ、軽量であり、かつ低コストで製造することができ、水に濡れても乾燥しても導電性が大幅に低下することがない生体電極用の生体接触層を形成できる生体電極組成物を提供する。【解決手段】（Ａ）イオン性材料、及び（Ｂ）前記（Ａ）成分以外の樹脂を含有する生体電極組成物であって、前記（Ａ）成分が、下記一般式（１）で示される部分構造を有するスルホンアミドのリチウム塩、ナトリウム塩、カリウム塩、アンモニウム塩の繰り返し単位ａと、珪素を有する繰り返し単位ｂの両方を有するものである生体電極組成物。−Ｒ１−Ｃ（＝Ｏ）−Ｎ−−ＳＯ２−Ｒｆ１Ｍ＋（１）【選択図】図１

生体電極組成物、生体電極、生体電極の製造方法、及び高分子化合物

A novel organic silicon compound and hydrolyzate thereof are provided in which an alkoxysilane having an alkoxy radical attached to the silicon atom is attached to a polyester through an alkylene radical. They are useful as a plasticizer for rubber.

Organic silicon compounds, hydrolyzates thereof, and rubber plasticizers

PROBLEM TO BE SOLVED: To provide a method for forming a multilayer film to be used as a resist underlay film in lithography, in which the multilayer film may reduce a reflectance, and which is useful for a pattern forming method at high dimensional accuracy in dry etching.SOLUTION: The method for forming a multilayer film includes: (i) a step of coating a substrate with an underlay film material containing any one or more of (1) a resin having a repeat unit including a specific fluorene structure, (2) a resin having a repeating unit including a specific fluorene structure different from (1), and (3) a compound containing a specific fluorene structure, heat-treating the material at a temperature of 300°C or higher and 800°C or lower for duration of 10 seconds to 4,000 seconds to cure so as to form an underlay film; (ii) a step of forming a titanium nitride film or a titanium oxide nitride film on the underlay film; (iii) a step of forming a hydrocarbon film on the titanium nitride film or the titanium oxide nitride film; and (iv) a step of forming a silicon oxide film on the hydrocarbon film.SELECTED DRAWING: None

Method for forming multilayer film and pattern forming method

PROBLEM TO BE SOLVED: To provide a polymerizable monomer for a resist material, which has excellent transparency to KrF laser light, ArF laser light and Flaser light and excellent development characteristics and which allows formation of a negative pattern having a high contrast, high resolution and excellent etching durability and insoluble with an alkali developer.SOLUTION: The polymerizable monomer is represented by formula (1a) or (1b).SELECTED DRAWING: None

Jun Hatakeyama

Papers

Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound

生体電極組成物、生体電極、生体電極の製造方法、及び高分子化合物

Organic silicon compounds, hydrolyzates thereof, and rubber plasticizers

Method for forming multilayer film and pattern forming method

Polymerizable monomer, polymer compound, resist material and pattern forming method