J
Junichiro Sakata
Researcher at Epson
Publications - 141
Citations - 4203
Junichiro Sakata is an academic researcher from Epson. The author has contributed to research in topics: Layer (electronics) & Semiconductor device. The author has an hindex of 25, co-authored 141 publications receiving 4194 citations.
Papers
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Journal ArticleDOI
15.2: Development of Driver‐Integrated Panel Using Amorphous In‐Ga‐Zn‐Oxide TFT
Takeshi Osada,Kengo Akimoto,Takehisa Sato,Masataka Ikeda,Masashi Tsubuku,Junichiro Sakata,Jun Koyama,Tadashi Serikawa,Shunpei Yamazaki +8 more
TL;DR: This work designed, prototyped, and evaluated LCD integrated with a gate driver and a source driver using amorphous In‐Ga‐Zn‐Oxide TFTs having bottom‐gate bottom‐contact structure, thereby obtaining T FTs with superior characteristics.
Journal ArticleDOI
21.3: 4.0 In. QVGA AMOLED Display Using In-Ga-Zn-Oxide TFTs with a Novel Passivation Layer
Hiroki Ohara,Toshinari Sasaki,Kousei Noda,Shunichi Ito,Miyuki Sasaki,Yayoi Toyosumi,Yuta Endo,Shuhei Yoshitomi,Junichiro Sakata,Tadashi Serikawa,Shunpei Yamazaki +10 more
TL;DR: In this paper, a 4.0 inch QVGA AMOLED display using amorphous In-Ga-Zn-Oxide TFTs, focusing on a passivation layer, was developed.
Patent
Light emitting device and method for manufacturing the same
TL;DR: A light-emitting device has a driver circuit and a pixel portion including a transistor for a pixel over one substrate as mentioned in this paper, which are inverted staggered transistors each including an oxide semiconductor layer in contact with part of an oxide insulating layer.
Journal ArticleDOI
P‐185: Low‐Drive‐Voltage OLEDs with a Buffer Layer Having Molybdenum Oxide
Hisao Ikeda,Junichiro Sakata,Masahiko Hayakawa,Tomoya Aoyama,Takahiro Kawakami,Koichiro Kamata,Yuji Iwaki,Satoshi Seo,Yumiko Noda,Ryoji Nomura,Shunpei Yamazaki +10 more
TL;DR: In this paper, a hole-transporting material with molybdenum oxide was used as a buffer layer on an anode to suppress pixel defect formation, and an OLED with low drive voltage can be obtained.
Patent
Transistor and display device
TL;DR: In this article, a bottom gate thin-film transistor including an amorphous oxide semiconductor, an oxide conductive layer having a crystal region is formed between a source and a drain layer using a metal material.