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Luke A. Sweatlock

Researcher at Northrop Grumman Corporation

Publications -  40
Citations -  5475

Luke A. Sweatlock is an academic researcher from Northrop Grumman Corporation. The author has contributed to research in topics: Plasmon & Surface plasmon. The author has an hindex of 21, co-authored 39 publications receiving 5093 citations. Previous affiliations of Luke A. Sweatlock include California Institute of Technology & Fundamental Research on Matter Institute for Atomic and Molecular Physics.

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Journal ArticleDOI

Plasmon slot waveguides: Towards chip-scale propagation with subwavelength-scale localization

TL;DR: In this article, a numerical analysis of surface plasmon waveguides exhibiting both long-range propagation and spatial confinement of light with lateral dimensions of less than 10% of the free-space wavelength is presented.
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Plasmonic Nanostructure Design for Efficient Light Coupling into Solar Cells

TL;DR: It is demonstrated that subwavelength scatterers can couple sunlight into guided modes in thin film Si and GaAs plasmonic solar cells whose back interface is coated with a corrugated metal film.
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Frequency tunable near-infrared metamaterials based on VO2 phase transition.

TL;DR: In this paper, an Ag split ring resonator (SRR) is patterned with e-beam lithography onto planar VO_2 and etched via reactive ion etching to yield Ag/VO_2 hybrid SRRs.
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Plasmostor: a-metal-oxide-si field effect plasmonic modulator

TL;DR: In this article, a photodetector is provided to generate an electric field across the conductive layers in response to an input optical gate signal, which is modulated by interaction with a plasmon wave generated at the semiconductor/conductive layer interface.
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Planar metal plasmon waveguides: frequency-dependent dispersion, propagation, localization, and loss beyond the free electron model

TL;DR: A numerical analysis of surface plasmon dispersion, propagation, and localization on smooth lossy films is presented in this paper, where wavelength-dependent behavior of thin Ag slab waveguides embedded in a symmetric SiO2 environment is investigated.