M
Mark S. Hybertsen
Researcher at Center for Functional Nanomaterials
Publications - 265
Citations - 28904
Mark S. Hybertsen is an academic researcher from Center for Functional Nanomaterials. The author has contributed to research in topics: Quasiparticle & Conductance. The author has an hindex of 75, co-authored 260 publications receiving 26170 citations. Previous affiliations of Mark S. Hybertsen include Brookhaven College & St. John's University.
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Patent
Monolithic array for vertical-cavity surface emitting laser device
TL;DR: In this article, a monolithic array for a vertical-cavity surface emitting laser (VCSEL) device used to emit light at a plurality of wavelengths, in which the gain peak of every device inside the array is tuned to a cavity mode, is realized with high reproducibility and with high accuracy.
Journal Article
Conductance of Molecular Wires Measured by STM- Break Junction
Jonathan R. Widawsky,Maria Kamenetska,Adam C. Whalley,Jennifer E. Klare,Colin Nuckolls,Mark S. Hybertsen,Latha Venkataraman +6 more
Patent
Semiconductor optical devices
Muhammad A. Alam,Eng Julie,Mark S. Hybertsen,J.E. Johnson,L.J.P. Ketelsen,Roosevelt People,Dennis Mark Romero +6 more
TL;DR: In this paper, a semiconductor optical device and a method of manufacture is described, which includes a first waveguide (15) having an edge (31), and a second waveguide(12) adjacent to at least a portion of the first waveguaranteed to be coupled from the first to the second waveguarded.
Journal ArticleDOI
Erratum: Absorption and luminescence studies of free-standing porous silicon films [Phys. Rev. B 49, 5386 (1994)]
Ya-Hong Xie,Mark S. Hybertsen,William L. Wilson,S. A. Ipri,G. E. Carver,W. L. Brown,E. Dons,B. E. Weir,Ahmet Refik Kortan,G. P. Watson,A. J. Liddle +10 more
Journal ArticleDOI
Graphene Oxidation: Thickness Dependent Etching and Strong Chemical Doping
Li Liu,Sunmin Ryu,Michelle R. Tomasik,Elena Stolyarova,Naeyoung Jung,Mark S. Hybertsen,Michael L. Steigerwald,Louis E. Brus,George W. Flynn +8 more
TL;DR: In this article, the authors show that O2 etching kinetics vary strongly with the number of layers in the sample and that basal plane oxygen species strongly hole dope graphene, with a Fermi level shift of ~0.5 eV.