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Masao Nishioka

Researcher at University of Tokyo

Publications -  94
Citations -  4567

Masao Nishioka is an academic researcher from University of Tokyo. The author has contributed to research in topics: Quantum dot & Photoluminescence. The author has an hindex of 25, co-authored 93 publications receiving 4360 citations.

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Photorefractive multiple quantum wells at 1064 nm.

TL;DR: This work fabricated photorefractive InGaAs/GaAs multiple quantum wells that are sensitive at wavelengths near 1.06 mum for what is believed to be the first time and measured four-wave-mixing diffraction efficiency, using a Nd:YAG laser.
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Ground state lasing at 1.30 µm from InAs/GaAs quantum dot lasers grown by metal–organic chemical vapor deposition

TL;DR: The onset temperature at which both the peak linewidth and the PL intensity degraded and the blueshift of the ground state emission wavelength occurred was found to depend on both the QD density and the capping layer, which is particularly important in view of QD integration in photonic devices.
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Optimizing the GaAs capping layer growth of 1.3 μm InAs/GaAs quantum dots by a combined two-temperature and annealing process at low temperatures

TL;DR: In this paper, a combined two-temperature and annealing process at low temperatures using metalorganic chemical vapor deposition was used to optimize the GaAs capping layer growth of 1.3 mu m InAs quantum dots.
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Growth of InAs/GaAs quantum dots on Si, Ge/Si and germanium-on-insulator-on-silicon (GeOI) substrates emitting in the 1.3 μm band for silicon photonics

TL;DR: In this paper, self-assembled InAs/GaAs quantum dots (QDs) were grown on Si, Ge/Si and GeOI substrates by metal organic chemical vapor deposition.
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Resonant photorefractive effect in InGaAs/GaAs multiple quantum wells.

TL;DR: A large photorefractive effect caused by the excitonic electro-optic effect is observed in semi-insulating InGaAs/GaAs multiple quantum wells fabricated by metal-organic vapor-phase epitaxy and proton implantation.