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Ming Li

Researcher at Shanghai Jiao Tong University

Publications -  383
Citations -  4768

Ming Li is an academic researcher from Shanghai Jiao Tong University. The author has contributed to research in topics: Copper & Intermetallic. The author has an hindex of 32, co-authored 364 publications receiving 3739 citations. Previous affiliations of Ming Li include Chinese Academy of Sciences.

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Effects of reduced graphene oxide film on bonding interfaces between Cu microcones and 25 μm Sn/Cu bumps

TL;DR: In this article, reduced graphene oxide (RGO) thin film was used to improve the performance of a low-temperature bonding process based on Cu microcones and Sn/Cu bumps.
Proceedings ArticleDOI

Preparation of Porous Au electrode used for additives investigation in copper filling

TL;DR: In this article, the suppressor PEG can suppress the copper deposition, lengthening the hole close time as to attain more time for the copper filling inside the holes, and further analysis on the current inside and outside the holes.
Proceedings ArticleDOI

Microstructure characteristics and properties of copper films sputtered in EMI shielding layer

Abstract: With the increase of system operating frequency and chip switching speed, electro-magnetic interference (EMI) shielding materials were wildly used in chip packaging technology. Packaging manufacturing process which bring cracks from the outer EMI shielding layer into the inner die has important influence on chip quality. In this paper, the influence on manufacturing parameters, such as film thickness and self-annealing time, on film strength were investigated. The microstructure characteristics and properties of copper films under different film thicknesses and self -annealing time were discussed. Microstructural characteristics were analyzed using field emission scanning electron microscopy (FESEM) and film properties were measured by nano-indentation instrument. Experimental results show that the 4um thickness of sputter copper film can achieve the lowest hardness performance and highest young's modulus of 108.3GPa. After 60 hours of self-annealing at room temperature, the grain was more stable than that of electroplated copper. The film thickness was proved to have significant influence on chips mechanical properties. Microstructure characteristics when stainless steel was sputtered on the top layer is discussed.
Proceedings ArticleDOI

Effect of Al-0.5%Cu thin film on reliability of IGBT module

TL;DR: In this article, a finite element analysis (FEA) simulation has been used to estimate the influence of Al-Cu thin film to the thermal stress of bonding wire, and the results show that insertion of Al 0.5% Cu thin film can improve the reliability of bond wire.
Proceedings ArticleDOI

Productivity improvement of stack package line through die bonding process & scheme optimization

TL;DR: In this article, the authors use TRIZ, an inventive problem solving theory and application tool, to analyze and abstract the major contradictions and then sketch out possible solutions to improve the performance of Stack CSP assembly.