Silicon lasers have long been a goal for semiconductor scientists, and a number of important breakthroughs in the past decade have focused attention on silicon as a photonic platform. Here we review the most recent progress in this field, including low-threshold silicon Raman lasers with racetrack ring resonator cavities, the first germanium-on-silicon lasers operating at room temperature, and hybrid silicon microring and microdisk lasers. The fundamentals of carrier transition physics in crystalline silicon are discussed briefly. The basics of several important approaches for creating lasers on silicon are explained, and the challenges and opportunities associated with these approaches are discussed. Silicon lasers have long been a goal for semiconductor scientists. This Progress Article reviews the most recent developments in this field, including silicon Raman lasers, the first germanium-on-silicon lasers operating at room temperature, and hybrid silicon microring and microdisk lasers. Challenges and opportunities for the present approaches are also discussed.

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Recent progress in lasers on silicon

Silicon has long been established as the material of choice for the microelectronics industry. This is not yet true in photonics, where the limited degrees of freedom in material design combined with the indirect bandgap are a major constraint. Recent developments, especially those enabled by nanoscale engineering of the electronic and photonic properties, are starting to change the picture, and some silicon nanostructures now approach or even exceed the performance of equivalent direct-bandgap materials. Focusing on two application areas, namely communications and photovoltaics, we review recent progress in silicon nanocrystals, nanowires and photonic crystals as key examples of functional nanostructures. We assess the state of the art in each field and highlight the challenges that need to be overcome to make silicon a truly high-performing photonic material.

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Silicon nanostructures for photonics and photovoltaics

Resistive switching effect in transition metal oxide (TMO) based material is often associated with the valence change mechanism (VCM). Typical modeling of valence change resistive switching memory consists of three closely related phenomena, i.e., conductive filament (CF) geometry evolution, conduction mechanism and temperature dynamic evolution. It is widely agreed that the electrochemical reduction-oxidation (redox) process and oxygen vacancies migration plays an essential role in the CF forming and rupture process. However, the conduction mechanism of resistive switching memory varies considerably depending on the material used in the dielectric layer and selection of electrodes. Among the popular observations are the Poole-Frenkel emission, Schottky emission, space-charge-limited conduction (SCLC), trap-assisted tunneling (TAT) and hopping conduction. In this article, we will conduct a survey on several published valence change resistive switching memories with a particular interest in the I-V characteristic and the corresponding conduction mechanism.

Conduction Mechanism of Valence Change Resistive Switching Memory: A Survey

Hybrid silicon lasers based on bonded III–V layers on silicon are currently the best contenders for on-chip lasers for silicon photonics. On-chip silicon light sources are highly desired for use as electrical-to-optical converters in silicon-based photonics. Zhiping Zhou and Bing Yin of Peking University in China and Jurgen Michel of Massachusetts Institute of Technology assess the three main contenders for such light sources: erbium-based light sources, germanium-on-silicon lasers and III-V-based silicon lasers. They consider operating wavelength, pumping conditions, power consumption, thermal stability and fabrication process. The scientists regard the power efficiencies of electrically pumped erbium-based lasers as being too low and the threshold currents of germanium lasers as being too high. They conclude that III–V quantum dot lasers monolithically grown on silicon show the most promise for realizing on-chip lasers.

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On-chip light sources for silicon photonics

The rapid development of information technology has led to urgent requirements for high efficiency and ultralow power consumption. In the past few decades, neuromorphic computing has drawn extensive attention due to its promising capability in processing massive data with extremely low power consumption. Here, we offer a comprehensive review on emerging artificial neuromorphic devices and their applications. In light of the inner physical processes, we classify the devices into nine major categories and discuss their respective strengths and weaknesses. We will show that anion/cation migration-based memristive devices, phase change, and spintronic synapses have been quite mature and possess excellent stability as a memory device, yet they still suffer from challenges in weight updating linearity and symmetry. Meanwhile, the recently developed electrolyte-gated synaptic transistors have demonstrated outstanding energy efficiency, linearity, and symmetry, but their stability and scalability still need to be optimized. Other emerging synaptic structures, such as ferroelectric, metal–insulator transition based, photonic, and purely electronic devices also have limitations in some aspects, therefore leading to the need for further developing high-performance synaptic devices. Additional efforts are also demanded to enhance the functionality of artificial neurons while maintaining a relatively low cost in area and power, and it will be of significance to explore the intrinsic neuronal stochasticity in computing and optimize their driving capability, etc. Finally, by looking into the correlations between the operation mechanisms, material systems, device structures, and performance, we provide clues to future material selections, device designs, and integrations for artificial synapses and neurons.

A comprehensive review on emerging artificial neuromorphic devices

We report a study of resistive switching in a silicon-based memristor/resistive RAM (RRAM) device in which the active layer is silicon-rich silica. The resistive switching phenomenon is an intrinsic property of the silicon-rich oxide layer and does not depend on the diffusion of metallic ions to form conductive paths. In contrast to other work in the literature, switching occurs in ambient conditions, and is not limited to the surface of the active material. We propose a switching mechanism driven by competing field-driven formation and current-driven destruction of filamentary conductive pathways. We demonstrate that conduction is dominated by trap assisted tunneling through noncontinuous conduction paths consisting of silicon nanoinclusions in a highly nonstoichiometric suboxide phase. We hypothesize that such nanoinclusions nucleate preferentially at internal grain boundaries in nanostructured films. Switching exhibits the pinched hysteresis I/V loop characteristic of memristive systems, and on/off resistance ratios of 104:1 or higher can be easily achieved. Scanning tunneling microscopy suggests that switchable conductive pathways are 10 nm in diameter or smaller. Programming currents can be as low as 2 μA, and transition times are on the nanosecond scale.

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Resistive switching in silicon suboxide films

Silicon nanocrystallites (nc-Si) were obtained by thermal annealing treatments of SiO∕SiO2 multilayers, prepared by evaporation. The nc-Si size was controlled by the SiO thickness. In this study the SiO2 thickness was maintained at 5nm and the SiO thickness was varied from 2to6nm. The film’s microstructure was studied by transmission electron microscopy. A strong photoluminescence was obtained in the visible range which corresponds to the radiative recombination of electron-hole pairs in the nc-Si. The electroluminescence signal is weaker and broader than the photoluminescence one. A model taking into account SiO2 defects and nc-Si is proposed to explain the electroluminescence results.

https://hal.archives-ouvertes.fr/hal-02164227/document

Photoluminescence and electroluminescence of size-controlled silicon nanocrystallites embedded in SiO2 thin films

This study reports the estimation of the inverted Er fraction in a system of Er doped silicon oxide sensitized by Si nanoclusters, made by magnetron sputtering. Electroluminescence was obtained from the sensitized erbium, with a power efficiency of 102%. By estimating the density of Er ions that are in the first excited state, we find that up to 20% of the total Er concentration is inverted in the best device, which is one order of magnitude higher than that achieved by optical pumping of similar materials.

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Towards population inversion of electrically pumped Er ions sensitized by Si nanoclusters

We have studied the current transport and electroluminescence properties of metal oxide semiconductor (MOS) devices in which the oxide layer, which is codoped with silicon nanoclusters and erbium ions, is made by magnetron sputtering. Electrical measurements have allowed us to identify a Poole–Frenkel conduction mechanism. We observe an important contribution of the Si nanoclusters to the conduction in silicon oxide films, and no evidence of Fowler–Nordheim tunneling. The results suggest that the electroluminescence of the erbium ions in these layers is generated by energy transfer from the Si nanoparticles. Finally, we report an electroluminescence power efficiency above 10−3%.

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Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions

This study attempts to clarify the origin of the temperature dependence of the photoluminescence (PL) spectra of silicon nanocrystals (Si-ncs) embedded in SiO2 from 5 to 300 K. For this purpose, size-controlled Si-ncs with a narrow size distribution were fabricated, using the SiO/SiO2 multilayer structure. The PL intensity is strongly temperature dependent and presents a maximum at around 70 K, depending on the Si-nc size and on the excitation power. The origin of this maximum is first discussed thanks to PL dynamics study and power dependence study. The evolution of the PL energy with temperature is also discussed. In bulk semiconductors the temperature dependence of the gap is generally well represented by Varshni’s law. Taking into account the quantum confinement energy, the PL energy of Si-ncs follows very well this law in the range 50–300 K. Below 50 K, a strong discrepancy to this law is observed characterized by a strong increase in the PL energy at low temperature, which is dependent on the Si-nc ...

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Olivier Jambois

Papers

Resistive switching in silicon suboxide films

Photoluminescence and electroluminescence of size-controlled silicon nanocrystallites embedded in SiO2 thin films

Towards population inversion of electrically pumped Er ions sensitized by Si nanoclusters

Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions

Photoluminescence properties of size-controlled silicon nanocrystals at low temperatures