Sixty-gigahertz power (PA) and low-noise (LNA) amplifiers have been implemented, based on algorithmic design methodologies for mm-wave CMOS amplifiers, in a 90-nm RF-CMOS process with thick 9-metal-layer Cu backend and transistor fT/fMAX of 120 GHz/200 GHz. The PA, fabricated for the first time in CMOS at 60 GHz, operates from a 1.5-V supply with 5.2 dB power gain, a 3-dB bandwidth >13 GHz, a P 1dB of +6.4 dBm with 7% PAE and a saturated output power of +9.3 dBm at 60 GHz. The LNA represents the first 90-nm CMOS implementation at 60 GHz and demonstrates improvements in noise, gain and power dissipation compared to earlier 60-GHz LNAs in 160-GHz SiGe HBT and 0.13-mum CMOS technologies. It features 14.6 dB gain, an IIP 3 of -6.8 dBm, and a noise figure lower than 5.5 dB, while drawing 16 mA from a 1.5-V supply. The use of spiral inductors for on-chip matching results in highly compact layouts, with the total PA and LNA die areas with pads measuring 0.35times0.43 mm2 and 0.35times0.40 mm2, respectively

Algorithmic Design of CMOS LNAs and PAs for 60-GHz Radio

Silicon planar and three-dimensional inductors and transformers were designed and characterized on-wafer up to 100 GHz. Self-resonance frequencies (SRFs) beyond 100 GHz were obtained, demonstrating for the first time that spiral structures are suitable for applications such as 60-GHz wireless local area network and 77-GHz automotive RADAR. Minimizing area over substrate is critical to achieving high SRF. A stacked transformer is reported with S/sub 21/ of -2.5 dB at 50 GHz, and which offers improved performance and less area (30 /spl mu/m/spl times/30 /spl mu/m) than planar transformers or microstrip couplers. A compact inductor model is described, along with a methodology for extracting model parameters from simulated or measured y-parameters. Millimeter-wave SiGe BiCMOS mixer and voltage-controlled-oscillator circuits employing spiral inductors are presented with better or comparable performance to previously reported transmission-line-based circuits.

/pdf/30-100-ghz-inductors-and-transformers-for-millimeter-wave-bi-4ok6bcbl07.pdf

30-100-GHz inductors and transformers for millimeter-wave (Bi)CMOS integrated circuits

This expanded and thoroughly revised edition of Thomas H. Lee's acclaimed guide to the design of gigahertz RF integrated circuits features a completely new chapter on the principles of wireless systems. The chapters on low-noise amplifiers, oscillators and phase noise have been significantly expanded as well. The chapter on architectures now contains several examples of complete chip designs that bring together all the various theoretical and practical elements involved in producing a prototype chip. First Edition Hb (1998): 0-521-63061-4 First Edition Pb (1998); 0-521-63922-0

The Design of CMOS Radio-Frequency Integrated Circuits: RF CIRCUITS THROUGH THE AGES

This paper provides evidence that, as a result of constant-field scaling, the peak f T (approx. 0.3 mA/μm), peak f MAX (approx. 0.2 mA/μm), and optimum noise figure NF MIN (approx. 0.15 mA/pm) current densities of Si and SOI n-channel MOSFETs are largely unchanged over technology nodes and foundries. It is demonstrated that the characteristic current densities also remain invariant for the most common circuit topologies such as MOSFET cascodes, MOS-SiGe HBT cascodes, current-mode logic (CML) gates, and nMOS transimpedance amplifiers (TIAs) with active pMOSFET loads. As a consequence, it is proposed that constant current-density biasing schemes be applied to MOSFET analog/mixed-signal/RF and high-speed digital circuit design. This will alleviate the problem of ever-diminishing effective gate voltages as CMOS is scaled below 90 nm, and will reduce the impact of statistical process variation, temperature and bias current variation on circuit performance. The second half of the paper illustrates that constant current-density biasing allows for the porting of SiGe BiCMOS cascode operational amplifiers, low-noise CMOS TIAs, and MOS-CML and BiCMOS-CML logic gates and output drivers between technology nodes and foundries, and even from bulk CMOS to SOI processes, with little or no redesign. Examples are provided of several record-setting circuits such as: 1) SiGe BiCMOS operational amplifiers with up to 37-GHz unity gain bandwidth; 2) a 2.5-V SiGe BiCMOS high-speed logic chip set consisting of 49-GHz retimer, 40-GHz TIAs, 80-GHz output driver with pre-emphasis and output swing control; and 3) 1-V 90-nm bulk and SOI CMOS TIAs with over 26-GHz bandwidth, less than 8-dB noise figure and operating at data rates up to 38.8 Gb/s. Such building blocks are required for the next generation of low-power 40-80 Gb/s wireline transceivers.

The invariance of characteristic current densities in nanoscale MOSFETs and its impact on algorithmic design methodologies and design porting of Si(Ge) (Bi)CMOS high-speed building blocks

This paper provides evidence that, as a result of constant-field scaling, the peak fT (approx. 0.3 mA/mum), peak fMAX (approx. 0.2 mA/mum), and optimum noise figure NFMIN (approx. 0.15 mA/mum) current densities of Si and SOI n-channel MOSFETs are largely unchanged over technology nodes and foundries. It is demonstrated that the characteristic current densities also remain invariant for the most common circuit topologies such as MOSFET cascodes, MOS-SiGe HBT cascodes, current-mode logic (CML) gates, and nMOS transimpedance amplifiers (TIAs) with active pMOSFET loads. As a consequence, it is proposed that constant current-density biasing schemes be applied to MOSFET analog/mixed-signal/RF and high-speed digital circuit design. This will alleviate the problem of ever-diminishing effective gate voltages as CMOS is scaled below 90 nm, and will reduce the impact of statistical process variation, temperature and bias current variation on circuit performance. The second half of the paper illustrates that constant current-density biasing allows for the porting of SiGe BiCMOS cascode operational amplifiers, low-noise CMOS TIAs, and MOS-CML and BiCMOS-CML logic gates and output drivers between technology nodes and foundries, and even from bulk CMOS to SOI processes, with little or no redesign. Examples are provided of several record-setting circuits such as: 1) SiGe BiCMOS operational amplifiers with up to 37-GHz unity gain bandwidth; 2) a 2.5-V SiGe BiCMOS high-speed logic chip set consisting of 49-GHz retimer, 40-GHz TIAs, 80-GHz output driver with pre-emphasis and output swing control; and 3) 1-V 90-nm bulk and SOI CMOS TIAs with over 26-GHz bandwidth, less than 8-dB noise figure and operating at data rates up to 38.8 Gb/s. Such building blocks are required for the next generation of low-power 40-80 Gb/s wireline transceivers

The Invariance of Characteristic Current Densities in Nanoscale MOSFETs and Its Impact on Algorithmic Design Methodologies and Design Porting of Si(Ge) (Bi)CMOS High-Speed Building Blocks

The paper presents an overview of Si MOSFET, SiGe HBT, and InP HBT device and circuit performance for broadband and tuned millimeter-wave applications. Implementations of CMOS-only, SiGe-HBT-only, SiGe BiCMOS, and InP-HBT 30-80 Gb/s high-speed circuit in production 130-nm SiGe BiCMOS and InP HBT technologies are compared.

https://www.eecg.toronto.edu/~sorinv/papers/Voinigescu_paper_SiRF.pdf

A comparison of Si CMOS, SiGe BiCMOS, and InP HBT technologies for high-speed and millimeter-wave ICs

A high-speed input comparator and output driver with adjustable pre-emphasis for applications in serial interchip communications over backplanes at 20 Gb/s is presented. The circuit was implemented in 130-nm CMOS and consumes 140 mW from a 1.5-V supply. It has over 30 dB dynamic range with a sensitivity of 20 mVp-p and a differential output swing of 700 mVp-p at 20 Gb/s. The output driver features a novel digital pre-emphasis circuit with independent pulse height and width control. Other features include 30%-70% eye-crossing control and adjustable output swing between 170 mVp-p and 350 mVp-p per side at data rates up to 30 Gb/s.

/pdf/a-1-5v-20-30-gb-s-cmos-backplane-driver-with-digital-pre-3knw1vu39q.pdf

P. Westergaard

Papers

The invariance of characteristic current densities in nanoscale MOSFETs and its impact on algorithmic design methodologies and design porting of Si(Ge) (Bi)CMOS high-speed building blocks

The Invariance of Characteristic Current Densities in Nanoscale MOSFETs and Its Impact on Algorithmic Design Methodologies and Design Porting of Si(Ge) (Bi)CMOS High-Speed Building Blocks

A comparison of Si CMOS, SiGe BiCMOS, and InP HBT technologies for high-speed and millimeter-wave ICs

A 1.5V 20/30 Gb/s CMOS backplane driver with digital pre-emphasis