P
Pallab Banerji
Researcher at Indian Institute of Technology Kharagpur
Publications - 77
Citations - 1395
Pallab Banerji is an academic researcher from Indian Institute of Technology Kharagpur. The author has contributed to research in topics: Thermoelectric effect & Metalorganic vapour phase epitaxy. The author has an hindex of 24, co-authored 65 publications receiving 1245 citations. Previous affiliations of Pallab Banerji include Indian Institutes of Technology.
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Embedded Ag-rich nanodots in PbTe: Enhancement of thermoelectric properties through energy filtering of the carriers
TL;DR: The concept of energy filtering of the carriers to control the thermoelectric properties of PbTe is experimentally applied in this paper, where the energy barriers at the grain interfaces of the nanocomposites and the embedded Ag-rich nanodots within the grains are supposed to control energy dependency of carrier scattering.
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Properties of indium doped nanocrystalline ZnO thin films and their enhanced gas sensing performance
TL;DR: In this article, the effect of indium doping on the electrical parameters of ZnO is analyzed through Hall effect measurements at room temperature, and it is argued that the sensor performance can be dramatically improved by tailoring the indium concentration in ZnOs for its practical application in various sectors.
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Catalyst-free direct growth of InP quantum dots on Si by MOCVD: a step toward monolithic integration
TL;DR: InP quantum dots (QDs) were grown on catalyst-free Si substrates by MOCVD to study the behavior of growth of low dimensional III-V structures.
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Role of oxygen vacancy in optical and gas sensing characteristics of ZnO thin films
TL;DR: In this article, the room-temperature photoluminescence (PL) spectra of nano-crystalline zinc oxide thin films are characterized in terms of structure, microstructure, optical and carbon monoxide gas sensing characteristics.
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Studies on resistive switching characteristics of aluminum/graphene oxide/semiconductor nonvolatile memory cells
TL;DR: In this paper, a semiconductor-based resistive switching nonvolatile memory devices with graphene oxide (GO) as an active layer which is sandwiched between aluminum (Al) metal and semiconductors such as Si and Ge was reported.