Patricia G. Blauner

TL;DR: In this article, focused ion beams are used to repair photolithography masks and are of increasing technological interest in the repair of x-ray lithography mask and in integrated circuit restructuring.

TL;DR: In this paper, focused ion beam induced deposition of metals has up to now produced films with resistivities 30-5000 times higher than bulk values for metals because of high concentrations of impurities from the precursor gas incorporated into the films.

TL;DR: Ion induced deposition is a novel method of thin film growth in which a local gas ambient is created near an ion bombarded surface as discussed by the authors, and the ion bombardment causes the gas molecules to break up and some of the gas constituents to deposit on the surface.

TL;DR: In this paper, the authors examined several techniques which have been proposed to minimize redeposition, including the use of thinner absorbers, gas assisted etching, and simple postrepair trimming.

TL;DR: In this paper, focused ion beam induced deposition of gold microfeatures is accomplished by 40 keV Ga+ bombardment of a substrate on which dimethyl gold hexafluoro acetylacetonate is continuously adsorbed.