S
S. A. Shivashankar
Researcher at Indian Institute of Science
Publications - 43
Citations - 667
S. A. Shivashankar is an academic researcher from Indian Institute of Science. The author has contributed to research in topics: Thin film & Metalorganic vapour phase epitaxy. The author has an hindex of 15, co-authored 43 publications receiving 589 citations.
Papers
More filters
Journal ArticleDOI
Kinetics of hydrogen evolution on submicron size Co, Ni, Pd and Co–Ni alloy powder electrodes by d.c. polarization and a.c. impedance studies
TL;DR: In this paper, the authors studied the kinetics of the hydrogen evolution reaction (HER) in 6 M KOH electrolyte on electrodes made from the pressed powders, and calculated the exchange current density (i(o)) and energy transfer coefficient (alpha) by employing a nonlinear least square-fitting program.
Journal ArticleDOI
Thermogravimetric evaluation of the suitability of precursors for MOCVD
TL;DR: In this paper, a method based on the Langmuir equation for the estimation of vapour pressure and enthalpy of sublimation of sub-liming compounds is described.
Journal ArticleDOI
Rapid growth of nanotubes and nanorods of würtzite ZnO through microwave-irradiation of a metalorganic complex of zinc and a surfactant in solution
TL;DR: In this paper, the growth process of single-crystalline ZnO nanorods and nanotubes has been investigated by varying the surfactant concentration and microwave irradiation time.
Journal ArticleDOI
Microwave irradiation-assisted deposition of Ga2O3 on III-nitrides for deep-UV opto-electronics
Piyush Jaiswal,Usman Ul Muazzam,Anamika Singh Pratiyush,Nagaboopathy Mohan,Srinivasan Raghavan,Rangarajan Muralidharan,S. A. Shivashankar,Digbijoy N. Nath +7 more
TL;DR: In this article, a visible-blind, deep-UV detector with a GaN-based heterostructure as the substrate was demonstrated on III-nitride epi-layers using the microwave irradiation technique.
Journal ArticleDOI
Low-pressure MOCVD of Al2O3 films using aluminium acetylacetonate as precursor: nucleation and growth
M.P Singh,S. A. Shivashankar +1 more
TL;DR: In this paper, a study of the deposition of aluminium oxide films by low-pressure metalorganic chemical vapour deposition from the complex aluminium acetylacetonate, in the absence of an oxidant gas, has been carried out.