S
S.N. Sharma
Researcher at University of Barcelona
Publications - 8
Citations - 167
S.N. Sharma is an academic researcher from University of Barcelona. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Glow discharge. The author has an hindex of 7, co-authored 8 publications receiving 165 citations.
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Nanoparticle formation in low-pressure silane plasmas: bridging the gap between a-Si:H and μc-Si films
TL;DR: In this paper, a detailed analysis of the structure of silicon films prepared under particular glow discharge conditions conclusively showed that nanometer-size ordered regions can be present in the matrix of this disordered semiconductor.
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Effect of the nanoparticles on the structure and crystallization of amorphous silicon thin films produced by rf glow discharge
TL;DR: In this article, thin films of nanostructured silicon (ns-Si:H) were deposited by plasmaenhanced chemical vapor deposition in the presence of silicon nanoparticles at 100 °C substrate temperature using a silane and hydrogen gas mixture under continuous wave (cw) plasma conditions.
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Nanometric powder of stoichiometric silicon carbide produced in square-wave modulated RF glow discharges
TL;DR: In this article, a SiC nanometric powder has been obtained in square-wave modulated radiofrequency glow discharges from CH 4 and SiH 4 gas mixtures, and the effects on the structure of the powder were examined by FTIR, EA, XPS and from optical transmittance measurements.
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SiCN nanometric powder produced in square-wave modulated RF glow discharges
TL;DR: In this paper, the authors present a study involving the production and characterisation of silicon carbon nitride (SiC ǫ n) nanometric powder, obtained from square-wave modulated RF plasmas of SiH4+CH4+NH3 and SiH 4 + CH4 + N2 gas mixtures.
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Nanopowder of silicon nitride produced in radio frequency modulated glow discharges from SiH4 and NH3
TL;DR: In this paper, the authors reported the production of SiN nanopowder at room temperature and low pressure by RF glow discharge decomposition of SiH 4 and NH 3 gases, where the RF power was modulated at 0.5 Hz with a duty cycle of 20% in order to control the size of the expelled particles.