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S. N. Varnakov

Researcher at Russian Academy of Sciences

Publications -  69
Citations -  424

S. N. Varnakov is an academic researcher from Russian Academy of Sciences. The author has contributed to research in topics: Ellipsometry & Magnetic field. The author has an hindex of 12, co-authored 66 publications receiving 378 citations. Previous affiliations of S. N. Varnakov include Siberian State Aerospace University & Novosibirsk State University.

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Magnetic-field- and bias-sensitive conductivity of a hybrid Fe/SiO2/p-Si structure in planar geometry

TL;DR: In this paper, the authors investigated magnetic-field and bias-sensitive features of the transport properties of a Fe/SiO2/p-Si hybrid structure in planar geometry at temperature variation.
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Study of the structural and magnetic characteristics of epitaxial Fe 3 Si/Si(111) films

TL;DR: In this paper, the structural and magnetic properties of the epitaxial structure of a single-crystal Fe3Si silicide film with the orientation Si[111] was identified using X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction.
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Magnetic anisotropy in Fe films deposited on SiO2/Si(001) and Si(001) substrates

TL;DR: In this paper, the magnetic anisotropy of 10-nm iron films was investigated in an ultra high vacuum on the Si(001) surface and on the 1.5-mm SiO2 buffer layer.
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Extremely large magnetoresistance induced by optical irradiation in the Fe/SiO2/p-Si hybrid structure with Schottky barrier

TL;DR: In this article, the authors reported the giant magnetoresistance (MR) effect that appeared under the influence of optical radiation in a common planar device built on Fe/SiO2/p-Si hybrid structure.
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Automation of Technological Equipment for Obtaining Multilayer Structures in an Ultrahigh Vacuum

TL;DR: In this paper, a complex of technological equipment for obtaining thin films and multilayer structures of semiconductor and magnetic materials in an ultrahigh vacuum is described, which is equipped with analytical facilities for in situ monitoring of the parameters of the obtained structures using the techniques of high energy electron diffraction, laser ellipsometry, and Auger electron spectroscopy.