Physical properties of ZnO:F obtained from a fresh and aged solution of zinc acetate and zinc acetylacetonate

The surface and materials science of tin oxide

We review work on In2O3:Sn films prepared by reactive e‐beam evaporation of In2O3 with up to 9 mol % SnO2 onto heated glass. These films have excellent spectrally selective properties when the deposition rate is ∼0.2 nm/s, the substrate temperature is ≳150 °C, and the oxygen pressure is ∼5×10−4 Torr. Optimized coatings have crystallite dimensions ≳50 nm and a C‐type rare‐earth oxide structure. We cover electromagnetic properties as recorded by spectrophotometry in the 0.2–50‐μm range, by X‐band microwave reflectance, and by dc electrical measurements. Hall‐effect data are included. An increase of the Sn content is shown to have several important effects: the semiconductor band gap is shifted towards the ultraviolet, the luminous transmittance remains high, the infrared reflectance increases to a high value beyond a certain wavelength which shifts towards the visible, phonon‐induced infrared absorption bands vanish, the microwave reflectance goes up, and the dc resisitivity drops to ∼2×10−4 Ω cm. The corre...

Evaporated Sn‐doped In2O3 films: Basic optical properties and applications to energy‐efficient windows

The present status and prospects for further development of polycrystalline or amorphous transparent conducting oxide (TCO) semiconductors used for practical thin-film transparent electrode applications are presented in this paper. The important TCO semiconductors are impurity-doped ZnO, In2O3 and SnO2 as well as multicomponent oxides consisting of combinations of ZnO, In2O3 and SnO2, including some ternary compounds existing in their systems. Development of these and other TCO semiconductors is important because the expanding need for transparent electrodes for optoelectronic device applications is jeopardizing the availability of indium-tin-oxide (ITO), whose main constituent, indium, is a very expensive and scarce material. Al- and Ga-doped ZnO (AZO and GZO) semiconductors are promising as alternatives to ITO for thin-film transparent electrode applications. In particular, AZO thin films, with a low resistivity of the order of 10−5 Ω cm and source materials that are inexpensive and non-toxic, are the best candidates. However, further development of the deposition techniques, such as magnetron sputtering or vacuum arc plasma evaporation, as well as of the targets is required to enable the preparation of AZO and GZO films on large area substrates with a high deposition rate.

https://iopscience.iop.org/article/10.1088/0268-1242/20/4/004/pdf

Transparent conducting oxide semiconductors for transparent electrodes

Optically transparent oxides tend to be electrical insulators, by virtue of their large electronic bandgap (⩾3.1 eV). The most notable exceptions are doped versions of the oxides In2O3, SnO2 and ZnO—all n-type (electron) conductors—which are widely used as the transparent electrodes in flat-panel displays1,2. On the other hand, no transparent oxide exhibiting high p-type (hole) conductivity is known to exist, whereas such materials could open the way to a range of novel applications. For example, a combination of the two types of transparent conductor in the form of a pn junction could lead to a ‘functional’ window that transmits visible light yet generates electricity in response to the absorption of ultraviolet photons. Here we describe a strategy for identifying oxide materials that should combine p-type conductivity with good optical transparency. We illustrate the potential of this approach by reporting the properties of thin films of CuAlO2, a transparent oxide having room-temperature p-type conductivity up to 1 S cm−1. Although the conductivity of our candidate material is significantly lower than that observed for the best n-type conducting oxides, it is sufficient for some applications, and demonstrates that the development of transparent p-type conductors is not an insurmountable goal.

P-type electrical conduction in transparent thin films of CuAlO2

Transparent conductors—A status review

The effect of hydrogen plasma treatment on indium tin oxide (ITO), fluorine‐doped tin oxide (FTO), and indium‐doped zinc oxide (IZO) films has been studied. X‐ray photoelectron spectroscopy analysis shows that ITO and FTO surfaces get reduced to yield elemental indium and tin, respectively. Annealing of the plasma treated films in air leads to re‐oxidation of the reduced surface and the electro‐optical properties are recovered. In contrast, IZO films are not reduced by plasma treatment and show no changes in the electrical and optical properties. The surface of plasma treated IZO films shows a higher binding energy O(1s) peak probably due to OH or OH...O species which appear to form a protective layer against plasma degradation.

S.S. Major

Papers

Transparent conductors—A status review

Effect of hydrogen plasma treatment on transparent conducting oxides

Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysis☆

Indium-doped zinc oxide films as transparent electrodes for solar cells

Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering