Sébastien Bérard-Bergery

TL;DR: In this paper, the authors investigate the potential of DSA to address contact and via levels patterning with high resolution by performing either CD shrink or contact multiplication, and compare different DSA processes based on several success criteria such as: CD control, defectivity, and placement control.

TL;DR: In this article, a rigorous lithographic model has been developed in Python to simulate the process of imaging, exposure and development of an i-line photoresist, and a mask data preparation algorithm capable of optimizing simultaneously both the size and position of the dots on a grayscale mask has been implemented.

TL;DR: The complete MP-EBL data preparation flow was demonstrated for a 28 nm node Metal1 layout in 37 hours, and the final verification step shows that the Edge Placement Error (EPE) is kept below 2.25 nm over an exposure dose variation of 8%.

TL;DR: This article proposes to use a dedicated edge detection algorithm to measure LER of 2D curvilinear patterns on CD-SEM images with excellent correlation between the input roughness parameters and the measured parameters for both 1D and 2D synthetic images.

TL;DR: In this paper, the authors used Monte-Carlo simulations to reconstruct the topographic shape of the observed pattern from SEM images, and then used a low-complexity linear model to obtain the geometrical parameters of the structure.